Specific Process Knowledge/Lithography/Resist: Difference between revisions
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=UV Resist= | =UV Resist= | ||
Standard UV sensitive resists available at DTU Nanolab: | |||
*[[Specific_Process_Knowledge/Lithography/5214E|AZ 5214E]] | |||
*[[Specific_Process_Knowledge/Lithography/MiR|AZ MiR 701]] | |||
*[[Specific_Process_Knowledge/Lithography/nLOF|AZ nLOF 2020]] | |||
*[[Specific_Process_Knowledge/Lithography/4562|AZ 4562]] | |||
*[[Specific_Process_Knowledge/Lithography/SU-8|SU-8]] | |||
*[[Specific_Process_Knowledge/Lithography/TIspray|TI Spray]] | |||
{{:Specific Process Knowledge/Lithography/Resist/UVresist}} | {{:Specific Process Knowledge/Lithography/Resist/UVresist}} | ||