Specific Process Knowledge/Lithography/PMMA

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Resist Polarity Manufacturer Comments Technical reports Spinner Thinner Developer Rinse Remover Process flows (in docx-format)
PMMA Positive AllResist We have various types of PMMA in the cleanroom. Please contact Lithography for information. MSDS PMMA, Processing guidelines See table here Anisole IPA:H2O (7:3), MIBK:IPA (1:3) IPA acetone/1165




Spin Curves

The thickness is measured on VASE Ellipsometer using a simple Cauchy model for a transparent polymer on Si. The measurements are performed at one incidence angle (70 degrees) only. 9 points on each 4" wafer has been measured; the standard deviation thus representing the homogeinity of the film on the 4" wafers. Please notice, that the spinning curves were made in 2015.


SpinCurvePMMA.jpg


AllResist AR-P 672.03 (PMMA) (~ 2ml per 4" wafer) spin coated on 'Spin Coater: Manual Standard Resists, E-5, WILTID & TIGRE, 26-10-2015. Softbake 3 min @ 150 degC.
Spin Speed [rpm] Acceleration [rpm/s] Thickness [nm] St Dev
4000 2000 95.55 0.55
5000 2000 85.50 0.92
7000 2000 72.79 1.18


AllResist AR-P 672.03 (PMMA) diluted 1:1 in Anisole (~ 2ml per 4" wafer) spin coated on 'Spin Coater: Manual Standard Resists, E-5, WILTID & TIGRE, 26-10-2015. Softbake 3 min @ 150 degC.
Spin Speed [rpm] Acceleration [rpm/s] Thickness [nm] St Dev
2000 2000 51.37 0.25
3000 2000 41.97 0.24
4000 2000 36.25 0.25
5000 2000 32.42 0.30
6000 2000 30.17 0.29
7000 2000 28.76 0.43