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25 April 2024
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07:31 | Specific Process Knowledge/Lithography/EBeamLithography/AR-P 617 2 changes history +20 [Thope (2×)] | |||
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07:31 (cur | prev) +17 Thope talk contribs (→Contrast curve) | ||||
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07:30 (cur | prev) +3 Thope talk contribs (→Contrast curve) | ||||
23 April 2024
| 10:50 | Specific Process Knowledge/Wafer and sample drying diffhist +11 Mbec talk contribs (→Ethanol fume dryer) | ||||
22 April 2024
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15:24 | Specific Process Knowledge/Etch/Etching of Silicon Oxide/SiO2 etch using ASE 6 changes history −5,026 [Mfarin (6×)] | |||
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15:24 (cur | prev) +7 Mfarin talk contribs (→C4F8/H2 chemistry - SiO2 etch) | ||||
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15:03 (cur | prev) −27 Mfarin talk contribs | ||||
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15:02 (cur | prev) −2 Mfarin talk contribs (→CF4/H2 chemistry - SiO2 etch) | ||||
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14:07 (cur | prev) −2,852 Mfarin talk contribs (→Recent results - CHF3/H2 and CF4/H2) | ||||
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14:07 (cur | prev) −4 Mfarin talk contribs (→CF4/H2 chemistry - SiO2/SiN etch) | ||||
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14:02 (cur | prev) −2,148 Mfarin talk contribs (→Recent results - CHF3/H2 and CF4/H2) | ||||
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14:06 | Specific Process Knowledge/Etch/Etching of Silicon Oxide/SiO2 etch using ASE/More test with CF4/H2, CHF3 and C4F8/H2 - SiO2 etch 4 changes history +2,271 [Mfarin (4×)] | |||
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14:06 (cur | prev) +5 Mfarin talk contribs (→Recent results - CF4 / H2 tests) | ||||
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14:06 (cur | prev) +14 Mfarin talk contribs (→Recent results - CF4 / H2 tests) | ||||
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14:03 (cur | prev) −5 Mfarin talk contribs (→Recipes and results - CF4 / H2 tests) | ||||
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14:03 (cur | prev) +2,257 Mfarin talk contribs | ||||
| 11:44 | Specific Process Knowledge/Lithography/EBL diffhist −1 Thope talk contribs (→JEOL 9500 and Raith eLine Plus specifications) | ||||
| 11:41 | Specific Process Knowledge/Lithography/EBeamLithography/JEOL 9500 User Guide diffhist −1 Thope talk contribs (→Techical Specification) | ||||