Recent changes
Track the most recent changes to the wiki on this page.
List of abbreviations:
- N
- This edit created a new page (also see list of new pages)
- m
- This is a minor edit
- b
- This edit was performed by a bot
- (±123)
- The page size changed by this number of bytes
12 June 2025
|
m 16:53 | Specific Process Knowledge/Process Flow 8 changes history +652 [Mmat (8×)] | |||
m |
|
16:53 (cur | prev) +200 Mmat talk contribs (→Characterization) | |||
m |
|
15:28 (cur | prev) +1 Mmat talk contribs (→The Process Flow) | |||
m |
|
15:28 (cur | prev) +158 Mmat talk contribs (→The Process Flow) | |||
m |
|
15:23 (cur | prev) −16 Mmat talk contribs (→The Process Flow) | |||
m |
|
15:23 (cur | prev) −12 Mmat talk contribs (→The Process Flow) | |||
m |
|
15:22 (cur | prev) −1 Mmat talk contribs (→The Process Flow) | |||
m |
|
15:22 (cur | prev) +284 Mmat talk contribs (→The Process Flow) | |||
m |
|
15:15 (cur | prev) +38 Mmat talk contribs (→The Process Flow) |
16:27 | Upload log Mmat talk contribs uploaded File:Rawta.png |
|
16:27 | Specific Process Knowledge/Lithography/EBeamLithography 3 changes history +147 [Elelop; Mmat (2×)] | |||
m |
|
16:27 (cur | prev) −10 Mmat talk contribs (→EBL staff at DTU Nanolab) | |||
m |
|
16:26 (cur | prev) +128 Mmat talk contribs (→EBL staff at DTU Nanolab) | |||
|
10:45 (cur | prev) +29 Elelop talk contribs (→EBL staff at DTU Nanolab) Tag: Visual edit |
|
15:56 | Specific Process Knowledge/Lithography/EBeamLithography/FirstEBL 2 changes history +31 [Elelop (2×)] | |||
|
15:56 (cur | prev) +2 Elelop talk contribs (→Job file verification) Tag: Visual edit | ||||
|
15:30 (cur | prev) +29 Elelop talk contribs (→Job file compilation) Tag: Visual edit |
11:21 | Specific Process Knowledge/Lithography/EBeamLithography/JEOLRequest diffhist 0 Elelop talk contribs (→Request for user exposure slot) |
11 June 2025
|
m 17:30 | June 2021 Survey 3 changes history +2 [Mmat (3×)] | |||
m |
|
17:30 (cur | prev) −30 Mmat talk contribs | |||
m |
|
17:30 (cur | prev) +24 Mmat talk contribs | |||
m |
|
17:29 (cur | prev) +8 Mmat talk contribs |
09:43 | User rights log Bghe talk contribs changed group membership for Mmat from NLAB-Employees-701 and NLAB-LabmanagerAllUsers to NLAB-Employees-701, NLAB-LabmanagerAllUsers and administrator |
10 June 2025
|
m 19:52 | LabAdviser:About 2 changes history −98 [Mmat (2×)] | |||
m |
|
19:52 (cur | prev) −133 Mmat talk contribs | |||
m |
|
19:33 (cur | prev) +35 Mmat talk contribs |
m 19:50 | LabAdviser:Copyright diffhist +1 Mmat talk contribs |
m 19:27 | LabAdviser/314/Microscopy 314-307/Technique/Holo diffhist −63 Mmat talk contribs |
m 19:27 | LabAdviser/314/Microscopy 314-307/FIB diffhist −65 Mmat talk contribs |
m 19:26 | Specific Process Knowledge/Characterization/XRD/HighScore analysis diffhist −45 Mmat talk contribs |
m 19:26 | Specific Process Knowledge/Thin film deposition/Deposition of polysilicon/Deposition of polysilicon using LPCVD diffhist −69 Mmat talk contribs |
m 19:26 | Specific Process Knowledge/Thin film deposition/Deposition of TiW/Sputtering of TiW in Wordentec/Grain size and uniformity of TiW layers diffhist −69 Mmat talk contribs |
m 19:26 | Specific Process Knowledge/Characterization/XRD/XRD SmartLab 9kW Rotating Anode diffhist −139 Mmat talk contribs |
m 19:25 | LabAdviser/314/Microscopy 314-307/Postprocessing diffhist −54 Mmat talk contribs |
m 19:25 | Specific Process Knowledge/Thin film deposition/Deposition of Magnesium diffhist −70 Mmat talk contribs |
m 19:25 | Specific Process Knowledge/Thin film deposition/Deposition of Scandium Nitride diffhist −69 Mmat talk contribs |
|
m 19:25 | LabAdviser/314/Microscopy 314-307/TEM 2 changes history −93 [Mmat (2×)] | |||
m |
|
19:25 (cur | prev) 0 Mmat talk contribs | |||
m |
|
19:24 (cur | prev) −93 Mmat talk contribs |
m 19:24 | Specific Process Knowledge/Thermal Process/Oxide mask diffhist −34 Mmat talk contribs |
m 19:23 | Specific Process Knowledge/Thin film deposition/Deposition of Scandium diffhist −69 Mmat talk contribs |
m 19:23 | LabAdviser/314/Preparation 314-307/Light-Mic diffhist −63 Mmat talk contribs |
|
m 19:23 | Specific Process Knowledge/Thermal Process/Oxidation/Oxidation on III-V oxidation furnace (C2) 4 changes history +191 [Mmat (4×)] | |||
m |
|
19:23 (cur | prev) −2 Mmat talk contribs | |||
m |
|
19:22 (cur | prev) +1 Mmat talk contribs | |||
m |
|
19:21 (cur | prev) +1 Mmat talk contribs | |||
m |
|
19:21 (cur | prev) +191 Mmat talk contribs |
m 19:19 | Specific Process Knowledge/Thermal Process/Oxidation/Wet oxidation E1 furnace diffhist −69 Mmat talk contribs |
m 19:17 | Specific Process Knowledge/Characterization/XRD/software diffhist −69 Mmat talk contribs |
m 19:17 | LabAdviser/314/Microscopy 314-307/TEM/T20/BF diffhist −63 Mmat talk contribs |
m 19:17 | LabAdviser/314/Microscopy 314-307/TEM/T20/DF diffhist −63 Mmat talk contribs |
m 19:17 | LabAdviser/314/Microscopy 314-307/TEM/T20/STEM diffhist −63 Mmat talk contribs |
m 19:16 | LabAdviser/314/Microscopy 314-307/TEM/Spectra Ultra diffhist −55 Mmat talk contribs |
|
m 17:43 | Specific Process Knowledge/Wafer Information 2 changes history +6 [Mmat (2×)] | |||
m |
|
17:43 (cur | prev) −97 Mmat talk contribs (→Wafers available in DTU Nanolabs cleanroom) | |||
m |
|
17:37 (cur | prev) +103 Mmat talk contribs (→Wafers available in DTU Nanolabs cleanroom) |
m 17:27 | User policy diffhist +27 Mmat talk contribs |
m 17:25 | Specific Process Knowledge/Imprinting diffhist −16 Mmat talk contribs (→Stamp for imprint) |