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5 October 2026
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18:58 | Specific Process Knowledge/Thin film deposition/ALD2 (PEALD)/TiN plasma deposition using ALD2 8 changes history +525 [Eves (8×)] | |||
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18:58 (cur | prev) +2 Eves talk contribs (→TiN plasma Nanolab Standard) | ||||
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18:56 (cur | prev) +31 Eves talk contribs (→TiN plasma Nanolab Standard) | ||||
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18:54 (cur | prev) +474 Eves talk contribs (→TiN plasma Nanolab Standard) | ||||
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18:51 (cur | prev) +12 Eves talk contribs (→TiN plasma Nanolab Standard) | ||||
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17:54 (cur | prev) 0 Eves talk contribs (→X-ray photoelectron spectroscopy) | ||||
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17:53 (cur | prev) 0 Eves talk contribs (→Spectroscopic Ellipsometry) | ||||
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17:52 (cur | prev) 0 Eves talk contribs (→Uniformity across 150 mm wafer) | ||||
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17:51 (cur | prev) +6 Eves talk contribs (→TiN ALD deposition using TiCl4 and NH3) | ||||
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18:06 | Specific Process Knowledge/Thin film deposition/ALD2 (PEALD)/Standard recipes on the ALD2 tool 2 changes history +13 [Eves (2×)] | |||
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18:06 (cur | prev) +1 Eves talk contribs | ||||
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18:05 (cur | prev) +12 Eves talk contribs (→SiO2 (Silicon dioxide)) | ||||
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18:03 | Specific Process Knowledge/Thin film deposition/ALD2 (PEALD) 13 changes history +62 [Eves (13×)] | |||
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18:03 (cur | prev) −148 Eves talk contribs (→Thermal processes:) | ||||
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18:03 (cur | prev) +148 Eves talk contribs (→Plasma processes:) | ||||
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18:03 (cur | prev) +2 Eves talk contribs (→Thermal processes:) | ||||
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17:29 (cur | prev) +6 Eves talk contribs (→Thermal processes:) | ||||
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17:28 (cur | prev) +3 Eves talk contribs (→Thermal processes:) | ||||
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17:28 (cur | prev) −22 Eves talk contribs (→Process information) | ||||
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17:28 (cur | prev) +28 Eves talk contribs (→Process information) | ||||
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17:27 (cur | prev) 0 Eves talk contribs (→Process information) | ||||
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17:27 (cur | prev) +11 Eves talk contribs (→Process information) | ||||
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17:27 (cur | prev) −1 Eves talk contribs (→Thermal processes:) | ||||
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17:27 (cur | prev) +4 Eves talk contribs (→Thermal processes:) | ||||
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17:26 (cur | prev) +2 Eves talk contribs (→Thermal processes:) | ||||
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17:26 (cur | prev) +29 Eves talk contribs (→Process information) | ||||
| N 17:46 | Specific Process Knowledge/Thin film deposition/ALD2 (PEALD)/TiN deposition using ALD2/old diffhist +4,172 Eves talk contribs (Created page with "'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/ALD2_(PEALD)/TiN_deposition_using_ALD2 click here]''' ''This page is written by DTU Nanolab internal'' =General information= As already mentioned in the general ALD2 (PEALD) page, oxides and nitrides cannot be deposited at the same time. Since deposition of aluminum nitride requ...") | ||||
| 17:42 | Specific Process Knowledge/Thin film deposition/Deposition of Titanium Nitride diffhist +141 Eves talk contribs (→Deposition of Titanium Nitride) | ||||
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17:24 | (Upload log) [Eves (7×)] | |||
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17:24 Eves talk contribs uploaded File:Eves TiN plasma ALD2 SE 450C 4000cycles p3 20230427.png (File uploaded with MsUpload) | ||||
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17:23 Eves talk contribs uploaded File:Eves TiN plasma ALD2 psi delta par 4000 20220617.png (File uploaded with MsUpload) | ||||
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17:22 Eves talk contribs uploaded File:Eves TiN plasma ALD2 psi delta par 3000 20220617.png (File uploaded with MsUpload) | ||||
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17:22 Eves talk contribs uploaded File:Eves TiN plasma ALD2 psi delta par 2000 20220617.png (File uploaded with MsUpload) | ||||
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17:22 Eves talk contribs uploaded File:Eves TiN plasma ALD2 psi delta par 1000 20220617.png (File uploaded with MsUpload) | ||||
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17:22 Eves talk contribs uploaded File:Eves TiN plasma ALD2 psi delta 4000 20220617.png (File uploaded with MsUpload) | ||||
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17:22 Eves talk contribs uploaded File:Eves TiN plasma ALD2 psi delta 3000 20220617.png (File uploaded with MsUpload) | ||||
