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Specific Process Knowledge/Lithography/Resist/UVresist: Difference between revisions

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Jehem (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, danchip
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Jehem (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, danchip
1,716 edits
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|-
|-
! scope=row| Resist
! scope=row| Resist
! AZ 5214E
! style="width: 15%;"| AZ 5214E
! AZ MIR 701
! style="width: 15%;"| AZ MIR 701
! AZ nLOF 2020
! style="width: 15%;"| AZ nLOF 2020
! AZ 4562
! style="width: 15%;"| AZ 4562
! SU-8
! style="width: 15%;"| SU-8
! Ti Spray
! style="width: 15%;"| Ti Spray
|-
|-
! scope=row| Maskless aligner
! scope=row| Maskless aligner
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