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Jehem (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, danchip
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===Aligner: MA6-2===
===Aligner: MA6-2===
The Aligner: MA6-2 has an i-line notch filter installed. This results in an exposure light peak around 365 nm with a FWHM of 7 nm.
The Aligner: MA6-2 has an i-line notch filter installed. This produces an exposure light peak around 365 nm with a FWHM of 7 nm.


'''New resists'''<br>
'''Quality control'''<br>
As of 2023-03-21 we no longer have any of the old versions of the resists: AZ 5214E, AZ 4562, AZ MiR 701. The following table contains only information about the new resist versions.
Please note that the values listed in the table are <i>'''not'''</i> routinely tested as part of quality control.


{|border="1" cellspacing="1" cellpadding="10" style="text-align:left;"  
{| class="wikitable"
|-
|-
 
!  !! Date !! Operator !! Film thickness !! Exposure mode !! Dose !! Resolution !! Comments
|-
|-
|-style="background:silver; color:black"
! scope=row| AZ MIR 701
|
| 2023-09-26 || taran || 1.5 µm || Hard contact || 150 mJ/cm<sup>2</sup> || ? µm || '''Not under regular quality control'''<br><br>Post exposure bake: 60 s @ 110°C<br>Development: 60 s puddle
!Date
!Thickness
!Dose
!Development
!Comments
|-
|-
 
! scope=row| AZ 5214E
| 2025-09-30 || jehem || 1.5 µm || Hard contact|| 90 mJ/cm<sup>2</sup> || 1.5 µm || '''Not under regular quality control'''<br><br>Development: 60 s puddle
|-
|-
|-style="background:whitesmoke; color:black"
! scope=row| AZ 5214E<br>Image reversal
!AZ MiR 701
| 2023-01-11 || jehem || 2.2 µm || Hard contact|| 22 mJ/cm<sup>2</sup> || 2.0 µm || '''Not under regular quality control'''<br><br>Reversal bake: 60 s @ 110°C<br>Flood exposure: 500 mJ/cm<sup>2</sup><br>Development: 60 s puddle
|2023-09-26<br>taran
|1.5 µm
|150 mJ/cm<sup>2</sup>
(13.5s @ 11mW/cm<sup>2</sup>)
|Single puddle, 60 s
|PEB: 60 s @ 110°C
|-
|-
 
! scope=row| AZ nLOF 2020  
|-
| 2023-09-26 || taran || 2.0 µm || Hard contact || 121 mJ/cm<sup>2</sup> || ? µm || '''Not under regular quality control'''<br><br>Post exposure bake: 60 s @ 110°C<br>Development: 60 s puddle
|-style="background:silver; color:black"
!AZ nLOF 2020
|2023-09-26<br>taran
|2 µm
|121 mJ/cm<sup>2</sup>
(11 s @ 11 mW/cm<sup>2</sup>)
|Single puddle, 60 s
|PEB: 60 s @ 110°C<br>60 s development for lift-off
|-
|-
! scope=row| AZ 4562
| 2021-12-08 || jehem || 10 µm || Soft contact|| 550 mJ/cm<sup>2</sup> || ≤5 µm || '''Not under regular quality control'''<br><br>Priming: HMDS<BR>Rehydration after SB: none<br>Exposure: Single exposure<br>Degassing after exposure: none<br>Development: 5 x 60 s multi puddle
|}


|-
'''New resists version in 2023'''<br>
|-style="background:WhiteSmoke; color:black"
As of 2023-03-21 we no longer have any of the old versions of the resists: AZ 5214E, AZ 4562, AZ MiR 701. This table contains only information about the new resist versions.
!AZ 5214E
|
<s>2023-01-11</s><br>
2025-09-30<br>jehem
|1.5 µm
|
<s>70 mJ/cm<sup>2</sup></s><br>
90 mJ/cm<sup>2</sup>
|Single puddle, 60 s
|
Resolution: ~1.5 um
|-


|-
|-style="background:silver; color:black"
!AZ 5214E<br>Image Reversal
|2023-01-11<br>jehem
|2.2 µm
|22 mJ/cm<sup>2</sup>
|Single puddle, 60 s
|
Reversal bake: 60 s at 110°C<br>
Flood exposure: 500 mJ/cm<sup>2</sup>
|-
|-
|-style="background:WhiteSmoke; color:black"
!AZ 4562<br>
|2021-12-08<br>jehem
|10 µm
|550 mJ/cm<sup>2</sup>
|Multiple puddles, 5 x 60 s
|
Priming: HMDS<BR>
Rehydration after SB: 1 hour (may not be necessary)<br>
Exposure: Multiple exposures with pauses, 5 x (10 s exposure + 10 s pause)<br>
Degassing after exposure: 1 hour (may not be necessary)
|-
|}
<br clear="all" />
<br clear="all" />


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