Specific Process Knowledge/Lithography/Resist/UVresist: Difference between revisions
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===Aligner: Maskless 03=== | ===Aligner: Maskless 03=== | ||
The Aligner: Maskless 03 has a 405 nm laser light source with a FWHM of ~1 nm. | The Aligner: Maskless 03 has a 405 nm laser light source with a FWHM of ~1 nm. The test exposures on this tool were made using the pneumatic autofocus system. | ||
'''Quality control'''<br> | '''Quality control'''<br> | ||