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Specific Process Knowledge/Lithography/Resist/UVresist: Difference between revisions

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Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,528 edits
Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,528 edits
Line 484: Line 484:
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
!AZ 5214E
!AZ 5214E
| 2023-07-06<br>jehem
| 2024-11-29<br>taran
| 1.5 µm
| 1.5 µm
| Fast
| Fast
| 110 mJ/cm<sup>2</sup>
| 105 mJ/cm<sup>2</sup>
| 0
| 3
| 1.75 µm
| 1.75 µm
| Dev: SP60s
| Dev: SP60s
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