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Specific Process Knowledge/Lithography/Resist/UVresist: Difference between revisions

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Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,528 edits
Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,528 edits
Line 597: Line 597:
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
!rowspan="2"| AZ 5214E
!rowspan="2"| AZ 5214E
|rowspan="2"| 2024-08-16<br>taran
|rowspan="2"| 2024-12-09<br>taran
|rowspan="2"| 1.5 µm
|rowspan="2"| 1.5 µm
|rowspan="2"| 375
|rowspan="2"| 375
| Optical
| Optical
|rowspan="2"| Quality
|rowspan="2"| Quality
|rowspan="2"| 95 mJ/cm<sup>2</sup>
|rowspan="2"| 100 mJ/cm<sup>2</sup>
| 2
| 2
|rowspan="2"| 1.5 µm
|rowspan="2"| 1.5 µm
Line 608: Line 608:
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
| Pneumatic
| Pneumatic
| -2
| -2 (?)
|-
|-


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