Specific Process Knowledge/Lithography/Resist/UVresist: Difference between revisions

@@ Line 554: / Line 554: @@
 |-style="background:WhiteSmoke; color:black"
 !rowspan="2"| AZ MiR 701
-|rowspan="2"| 2023-04-17 <br> jehem
+|rowspan="2"| 2023-08-21 <br> taran
 |rowspan="2"| 1.5 µm
 |rowspan="2"| 375
 | Optical
 |rowspan="2"| Quality
-|rowspan="2"| 385 mJ/cm<sup>2</sup>
+|rowspan="2"| 325 mJ/cm<sup>2</sup>
-| 0
+| 1
 |rowspan="2"| 1 µm<br>Tested using dehydration reducing measures
 |rowspan="2"|
@@ Line 573: / Line 573: @@
 |-style="background:silver; color:black"
 !rowspan="2"| AZ nLOF 2020
-|rowspan="2"| 2023-04-17 <br> jehem
+|rowspan="2"| 2023-08-21 <br> taran
 |rowspan="2"| 2.0 µm
 |rowspan="2"| 375
 | Optical
 |rowspan="2"| Quality
-|rowspan="2"| 550 mJ/cm<sup>2</sup>
+|rowspan="2"| 450 mJ/cm<sup>2</sup>
 | 0
 |rowspan="2"| 1.5 µm
@@ Line 592: / Line 592: @@
 |-style="background:WhiteSmoke; color:black"
 !rowspan="2"| AZ 5214E
-|rowspan="2"| 2023-04-04<br>jehem
+|rowspan="2"| 2023-08-18<br>jehem
 |rowspan="2"| 1.5 µm
 |rowspan="2"| 375
 | Optical
 |rowspan="2"| Quality
-|rowspan="2"| 110 mJ/cm<sup>2</sup>
+|rowspan="2"| 105 mJ/cm<sup>2</sup>
 | 0
-|rowspan="2"| 1 µm
+|rowspan="2"| 1.25 µm
 |rowspan="2"| Dev: SP60s
 |-style="background:WhiteSmoke; color:black"