Specific Process Knowledge/Lithography/Resist/UVresist: Difference between revisions
| Line 493: | Line 493: | ||
| 2.2 µm | | 2.2 µm | ||
| Fast | | Fast | ||
| 20 mJ/cm<sup>2</sup> | | <span style="color:red">possibly obsolete data</span><br>20 mJ/cm<sup>2</sup> | ||
| -2 | | <span style="color:red">possibly obsolete data</span><br>-2 | ||
| 2.0 µm | | 2.0 µm | ||
| Reversal bake: 60s@110°C,<br>Flood exposure: 500mJ/cm<sup>2</sup><br>Dev: SP60s | | Reversal bake: 60s@110°C,<br>Flood exposure: 500mJ/cm<sup>2</sup><br>Dev: SP60s | ||
| Line 505: | Line 505: | ||
| 10 µm | | 10 µm | ||
| Fast | | Fast | ||
| 1050 mJ/cm<sup>2</sup> | | <span style="color:red">possibly obsolete data</span><br>1050 mJ/cm<sup>2</sup> | ||
| -1 | | <span style="color:red">possibly obsolete data</span><br>-1 | ||
| ≤5 µm | | ≤5 µm | ||
| | | | ||