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Specific Process Knowledge/Lithography/Resist/UVresist: Difference between revisions

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Jehem (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, danchip
1,890 edits
Jehem (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, danchip
1,890 edits
Line 454: Line 454:
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
!AZ MiR 701
!AZ MiR 701
| 2023-04-04<br>jehem
| 2023-04-05<br>jehem
| 1.5 µm
| 1.5 µm
| Fast
| Fast
Line 478: Line 478:
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
!AZ 5214E
!AZ 5214E
| 2023-04-04<br>jehem
| 2023-04-05<br>jehem
| 1.5 µm
| 1.5 µm
| Fast
| Fast
| 95 mJ/cm<sup>2</sup>
| 120 mJ/cm<sup>2</sup>
| -3
| -3
| 2.0 µm
| 2.0 µm
Line 490: Line 490:
|-style="background:silver; color:black"
|-style="background:silver; color:black"
!AZ 5214E<br>image reversal
!AZ 5214E<br>image reversal
| 2023-04-04<br>jehem
| 2023-04-05<br>jehem
| 2.2 µm
| 2.2 µm
| Fast
| Fast
Line 502: Line 502:
|-style="background:whitesmoke; color:black"
|-style="background:whitesmoke; color:black"
!AZ 4562
!AZ 4562
| 2023-04-04<br>jehem
| 2023-04-05<br>jehem
| 10 µm
| 10 µm
| Fast
| Fast
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