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Specific Process Knowledge/Lithography/Resist/UVresist: Difference between revisions

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===Aligner: Maskless 03===
===Aligner: Maskless 03===
The Aligner: Maskless 03 has a 405 nm laser light source with a FWHM of ~1 nm.
The Aligner: Maskless 03 has a 405 nm laser light source with a FWHM of ~1 nm.
'''New resists'''<br>
As of 2023-03-21 we no longer have any of the old versions of the resists: AZ 5214E, AZ 4562, AZ MiR 701. The following table contains only information about the new resist versions.


{|border="1" cellspacing="1" cellpadding="10" style="text-align:left;"  
{|border="1" cellspacing="1" cellpadding="10" style="text-align:left;"  
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|-
|-
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
!rowspan="2"| AZ 5214E<br><span style="color:red">Old German version</span>
!AZ MiR 701
| 2020-10-01
| 2021-08-25<br>jehem
|rowspan="2"| 1.5 µm
| 1.5 µm
| 405 nm
| 405
| Pneumatic
| Fast
| 70 mJ/cm<sup>2</sup>
| 0
| 2 µm (due to stitching)
| Dev: SP60s
 
|-style="background:WhiteSmoke; color:black"
| 2021-03-23
| 405 nm
| Pneumatic
| Quality
| 65 mJ/cm<sup>2</sup>
| -2
| 1 µm
| Dev: SP60s
|-
 
|-
|-style="background:silver; color:black"
!rowspan="2"| AZ MiR 701<br><span style="color:red">Old PFOA containing version</span>
| 2020-02-01
|rowspan="2"| 1.5 µm
| 405 nm
| Pneumatic
| Fast
| 300 mJ/cm<sup>2</sup>
| 0
| 2 µm (due to stitching)<br>Non optimized dehydration reduction
| PEB: 60s@110°C, Dev: SP60s
 
|-style="background:silver; color:black"
| 2021-08-25
| 405 nm
| Pneumatic
| Pneumatic
| Quality
| Quality
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| -2
| -2
| 1 µm<br>Tested using dehydration reducing measures
| 1 µm<br>Tested using dehydration reducing measures
| PEB: 60s@110°C, Dev: SP60s
| PEB: 60s@110°C<br>Dev: SP60s
|-
 
|-
|-style="background:WhiteSmoke; color:black"
!rowspan="2"| AZ 5214E image reversal<br><span style="color:red">Old German version</span>
| 2020-10-01
|rowspan="2"| 2.2 µm
| 405 nm
| Pneumatic
| Fast
| 43 mJ/cm<sup>2</sup>
| 0
| >2 µm (a lot of stitching)
| Reversal bake: 120s@110°C, Flood exposure: 200mJ/cm<sup>2</sup>, Dev: SP60s
 
|-style="background:WhiteSmoke; color:black"
| 2021-08-25
| 405 nm
| Pneumatic
| Quality
| 32 mJ/cm<sup>2</sup>
| -1
| 1 µm
| Reversal bake: 120s@110°C, Flood exposure: 200mJ/cm<sup>2</sup>, Dev: SP60s
|-
|-


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|-style="background:silver; color:black"
|-style="background:silver; color:black"
!AZ nLOF 2020
!AZ nLOF 2020
| 2023-01-13
| 2023-01-13<br>jehem
| 2.0 µm
| 2.0 µm
| 405
| 405
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| 0
| 0
| 1 µm
| 1 µm
| PEB: 60s @ 100°C,<br>Dev: SP60s<br> '''Due to the high dose required on this tool, it is recommended to process nLOF on tools with a more appropriate exposure light source'''
|  
PEB: 60s @ 100°C<br>
Dev: SP60s<br>
<span style="color:red">'''Due to the high dose required on this tool, it is recommended to process nLOF on tools with a more appropriate exposure light source'''</span>
|-
|-


|-
|-
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
!AZ 5214E<br><span style="color:green">New Japanese version</span>
!AZ 5214E
| 2023-01-06
| 2023-01-06<br>jehem
| 1.5 µm
| 1.5 µm
| 405
| 405
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|-
|-
|-style="background:silver; color:black"
|-style="background:silver; color:black"
!AZ 5214E image reversal<br><span style="color:green">New Japanese version</span>
!AZ 5214E<br>Image reversal
| 2023-01-06
| 2023-01-06<br>jehem
| 2.2 µm
| 2.2 µm
| 405
| 405
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| -2
| -2
| 1 µm
| 1 µm
| Reversal bake: 60s@110°C, Flood exposure: 500mJ/cm<sup>2</sup>, Dev: SP60s
|  
|-
Reversal bake: 60s@110°C<br>
 
Flood exposure: 500mJ/cm<sup>2</sup><br>
|-
Dev: SP60s  
|-style="background:WhiteSmoke; color:black"
!AZ MiR 701<br><span style="color:green">New PFOA free version</span>
| 2021-08-25
| 1.5 µm
| 405
| Pneumatic
| Quality
| 175 mJ/cm<sup>2</sup>
| -2
| 1 µm<br>Tested using dehydration reducing measures
| PEB: 60s@110°C, Dev: SP60s
|-
|-


|-
|-
|-style="background:silver; color:black"
|-style="background:silver; color:black"
!AZ 4562<br><span style="color:green">New Japanese version</span>
!AZ 4562
| 2021-12-08
| 2021-12-08<br>jehem
| 10 µm
| 10 µm
| 405
| 405