Specific Process Knowledge/Lithography/Resist/UVresist: Difference between revisions
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===Aligner: Maskless 03=== | ===Aligner: Maskless 03=== | ||
The Aligner: Maskless 03 has a 405 nm laser light source with a FWHM of ~1 nm. | The Aligner: Maskless 03 has a 405 nm laser light source with a FWHM of ~1 nm. | ||
'''New resists'''<br> | |||
As of 2023-03-21 we no longer have any of the old versions of the resists: AZ 5214E, AZ 4562, AZ MiR 701. The following table contains only information about the new resist versions. | |||
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|- | |- | ||
|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; color:black" | ||
! | !AZ MiR 701 | ||
| 2021-08-25<br>jehem | |||
| 1.5 µm | |||
| 405 | |||
| 2021- | |||
| 405 | |||
| Pneumatic | | Pneumatic | ||
| Quality | | Quality | ||
| Line 762: | Line 731: | ||
| -2 | | -2 | ||
| 1 µm<br>Tested using dehydration reducing measures | | 1 µm<br>Tested using dehydration reducing measures | ||
| PEB: 60s@110°C | | PEB: 60s@110°C<br>Dev: SP60s | ||
|- | |- | ||
| Line 792: | Line 737: | ||
|-style="background:silver; color:black" | |-style="background:silver; color:black" | ||
!AZ nLOF 2020 | !AZ nLOF 2020 | ||
| 2023-01-13 | | 2023-01-13<br>jehem | ||
| 2.0 µm | | 2.0 µm | ||
| 405 | | 405 | ||
| Line 800: | Line 745: | ||
| 0 | | 0 | ||
| 1 µm | | 1 µm | ||
| PEB: 60s @ 100°C | | | ||
PEB: 60s @ 100°C<br> | |||
Dev: SP60s<br> | |||
<span style="color:red">'''Due to the high dose required on this tool, it is recommended to process nLOF on tools with a more appropriate exposure light source'''</span> | |||
|- | |- | ||
|- | |- | ||
|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; color:black" | ||
!AZ 5214E | !AZ 5214E | ||
| 2023-01-06 | | 2023-01-06<br>jehem | ||
| 1.5 µm | | 1.5 µm | ||
| 405 | | 405 | ||
| Line 819: | Line 767: | ||
|- | |- | ||
|-style="background:silver; color:black" | |-style="background:silver; color:black" | ||
!AZ 5214E | !AZ 5214E<br>Image reversal | ||
| 2023-01-06 | | 2023-01-06<br>jehem | ||
| 2.2 µm | | 2.2 µm | ||
| 405 | | 405 | ||
| Line 828: | Line 776: | ||
| -2 | | -2 | ||
| 1 µm | | 1 µm | ||
| Reversal bake: 60s@110°C | | | ||
Reversal bake: 60s@110°C<br> | |||
Flood exposure: 500mJ/cm<sup>2</sup><br> | |||
Dev: SP60s | |||
|- | |- | ||
|- | |- | ||
|-style="background:silver; color:black" | |-style="background:silver; color:black" | ||
!AZ 4562 | !AZ 4562 | ||
| 2021-12-08 | | 2021-12-08<br>jehem | ||
| 10 µm | | 10 µm | ||
| 405 | | 405 | ||