Specific Process Knowledge/Lithography/Resist/UVresist: Difference between revisions
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Priming: HMDS<br> | Priming: HMDS<br> | ||
Rehydration after softbake: 1 hour (may not be necessary)<br> | Rehydration after softbake: 1 hour (may not be necessary)<br> | ||
Exposure: Single exposure | Exposure: Single exposure<br> | ||
Degassing after exposure: 1 hour (may not be necessary)<br> | Degassing after exposure: 1 hour (may not be necessary)<br> | ||
Development: Multiple puddles, 5 x 60 s | Development: Multiple puddles, 5 x 60 s | ||