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Specific Process Knowledge/Lithography/Resist/UVresist: Difference between revisions

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Jehem (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, danchip
1,893 edits
Jehem (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, danchip
1,893 edits
Line 676: Line 676:
|rowspan="2"| 700 mJ/cm<sup>2</sup>
|rowspan="2"| 700 mJ/cm<sup>2</sup>
| 6
| 6
|rowspan="2"| 2.0 µm
|rowspan="2"| 1.5 µm
|rowspan="2"|
|rowspan="2"|
PEB: 60s @ 110°C<br>
PEB: 60s @ 110°C<br>
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