Specific Process Knowledge/Lithography/Resist/UVresist: Difference between revisions
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! scope=row| Resist | ! scope=row| Resist | ||
! style="width: 15%;"| [[Specific_Process_Knowledge/Lithography/5214E|AZ 5214E]] | |||
! style="width: 15%;"| [[Specific_Process_Knowledge/Lithography/MiR|AZ MiR 701]] | |||
! style="width: 15%;"| [[Specific_Process_Knowledge/Lithography/nLOF|AZ nLOF 2020]] | |||
! style="width: 15%;"| [[Specific_Process_Knowledge/Lithography/4562|AZ 4562]] | |||
! style="width: 15%;"| [[Specific_Process_Knowledge/Lithography/SU-8|SU-8]] | |||
! style="width: 15%;"| [[Specific_Process_Knowledge/Lithography/TIspray|TI Spray]] | |||
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! scope=row| Resist tone | ! scope=row| Resist tone | ||