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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, danchip
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Jehem (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, danchip
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===Aligner: MA6-1===
===Aligner: MA6-1===
The Aligner: MA6-1 has an i-line notch filter installed. This results in an exposure light peak around 365 nm with a FWHM of 7 nm.
The Aligner: MA6-1 has an i-line notch filter installed. This produces an exposure light peak around 365 nm with a FWHM of 7 nm.


{|border="1" cellspacing="1" cellpadding="10" style="text-align:left;"
'''Quality control'''<br>
|-
Please note that the values listed in the table are <i>'''not'''</i> routinely tested as part of quality control.


{| class="wikitable"
|-
|-
|-style="background:silver; color:black"
!  !! Date !! Operator !! Film thickness !! Exposure mode !! Dose !! Resolution !! Comments
|
!Date
!Thickness
!Dose
!Development]
!Comments
|-
 
|-
|-
|-style="background:WhiteSmoke; color:black"
! scope=row| AZ 5214E
!rowspan="3"|AZ 5214E<br><span style="color:red">Data from discontinued German version</span>
| Long ago || ? || 1.5 µm || ? || 70 mJ/cm<sup>2</sup> || ? µm || '''Not under regular quality control'''<br><br>Development: 60 s submersion
|Long ago
|1.5 µm
|70mJ/cm<sup>2</sup>
|60 s
|rowspan="3"|Positive process
|-style="background:WhiteSmoke; color:black"
|Long ago
|2.2 µm
|72 mJ/cm<sup>2</sup>
|70 s
|-style="background:WhiteSmoke; color:black"
|Long ago
|4.2 µm
|160 mJ/cm<sup>2</sup>
|180 s
|-
|-
 
! scope=row| AZ 5214E
| Long ago || ? || 2.2 µm || ? || 72 mJ/cm<sup>2</sup> || ? µm || '''Not under regular quality control'''<br><br>Development: 70 s submersion
|-
|-
|-style="background:LightGrey; color:black"
! scope=row| AZ 5214E
!rowspan="2"|AZ 5214E<br><span style="color:red">Data from discontinued German version</span>
| Long ago || ? || 4.2 µm || ? || 160 mJ/cm<sup>2</sup> || ? µm || '''Not under regular quality control'''<br><br>Development: 180 s submersion
|Long ago
|1.5 µm
|30 mJ/cm<sup>2</sup>
|60 s
|rowspan="2"|Image reversal process.
 
Reversal bake: 100s at 110°C.<br>Flood exposure after reversal bake: 210 mJ/cm<sup>2</sup>
|-style="background:LightGrey; color:black"
|Long ago
|2.2 µm
|35 mJ/cm<sup>2</sup>
|70 s
|-
|-
 
! scope=row| AZ 5214E<br>Image reversal
| Long ago || ? || 1.5 µm || ? || 30 mJ/cm<sup>2</sup> || ? µm || '''Not under regular quality control'''<br><br>Reversal bake: 100 s @ 110°C<br>Flood exposure: 210 mJ/cm<sup>2</sup><br>Development: 60 s submersion
|-
|-
|-style="background:WhiteSmoke; color:black"
! scope=row| AZ 5214E<br>Image reversal
!AZ 4562<br><span style="color:red">Data from discontinued German version</span>
| Long ago || ? || 2.2 µm || ? || 35 mJ/cm<sup>2</sup> || ? µm || '''Not under regular quality control'''<br><br>Reversal bake: 100 s @ 110°C<br>Flood exposure: 210 mJ/cm<sup>2</sup><br>Development: 70 s submersion
|Long ago
|10 µm
|320 mJ/cm<sup>2</sup>
|5 minutes
|Multiple exposure with 10-15 s pauses is recommended.
|-
|-
! scope=row| AZ 4562
| Long ago || ? || 10 µm || ? || 320 mJ/cm<sup>2</sup> || ? µm || '''Not under regular quality control'''<br><br>Priming: HMDS<BR>Rehydration after SB: none<br>Exposure: Multiple exposures with 15 s pauses is recommended<br>Degassing after exposure: none<br>Development: 300 s submersion
|}
|}
'''New resists version in 2023'''<br>
As of 2023-03-21 we no longer have any of the old versions of the resists: AZ 5214E, AZ 4562, AZ MiR 701. This table contains only information about the <i>old</i> resist versions.
<br clear="all" />
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