Specific Process Knowledge/Lithography/Resist/UVresist: Difference between revisions
| Line 469: | Line 469: | ||
|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; color:black" | ||
!AZ MiR 701 | !AZ MiR 701 | ||
| 2023-07-06<br>jehem | | <s>2023-07-06</s><br>2025-10-16<br>jehem | ||
| 1.5 µm | | 1.5 µm | ||
| Fast | | Fast | ||
| 275 mJ/cm<sup>2</sup> | | <s>275 mJ/cm<sup>2</sup></s><br>325 mJ/cm<sup>2</sup> | ||
| 1 | | <s>1</s><br>-1 | ||
| 1 µm<br>Tested using dehydration reducing measures | | <s>1 µm</s><br>1.5 µm<br>Tested using dehydration reducing measures | ||
| PEB: 60s@110°C<br>Dev: SP60s | | PEB: 60s@110°C<br>Dev: SP60s | ||
|- | |- | ||