Specific Process Knowledge/Lithography/Resist/UVresist: Difference between revisions
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==Exposure dose== | ==Exposure dose== | ||
[[Image:resistSensitivity_UV.png| | [[Image:resistSensitivity_UV.png|400px|thumb|Spectral sensitivity of AZ resists represented as optical absorption coefficient.]] | ||
During exposure of the resist, the photoinitiator, or photo-active component, reacts with the exposure light, and starts the reaction which makes the resist develop in the developer. | During exposure of the resist, the photoinitiator, or photo-active component, reacts with the exposure light, and starts the reaction which makes the resist develop in the developer. | ||