Specific Process Knowledge/Lithography/Resist/UVresist: Difference between revisions
| Line 628: | Line 628: | ||
|-style="background:whitesmoke; color:black" | |-style="background:whitesmoke; color:black" | ||
!rowspan="2"| AZ 4562 | !rowspan="2"| AZ 4562 | ||
|rowspan="2"| | |rowspan="2"| 2023-04-19<br>jehem | ||
|rowspan="2"| 10 µm | |rowspan="2"| 10 µm | ||
|rowspan="2"| 375 | |rowspan="2"| 375 | ||
| Optical | | Optical | ||
|rowspan="2"| Quality | |rowspan="2"| Quality | ||
|rowspan="2"| | |rowspan="2"| 1150 mJ/cm<sup>2</sup> | ||
| | | 0 | ||
|rowspan="2"| | |rowspan="2"| ≤5 µm | ||
|rowspan="2"| | |rowspan="2"| | ||
Priming: HMDS<br> | Priming: HMDS<br> | ||