Specific Process Knowledge/Lithography/Resist/UVresist: Difference between revisions
| Line 496: | Line 496: | ||
|- | |- | ||
|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; color:black" | ||
!AZ MiR 701 | !AZ MiR 701 | ||
| 2023-04-04 | | 2023-04-04<br>jehem | ||
| 1.5 µm | | 1.5 µm | ||
| Fast | | Fast | ||
| Line 509: | Line 509: | ||
|-style="background:silver; color:black" | |-style="background:silver; color:black" | ||
!AZ nLOF 2020 | !AZ nLOF 2020 | ||
| 2023-04-04 | | 2023-04-04<br>jehem | ||
| 2.0 µm | | 2.0 µm | ||
| Fast | | Fast | ||
| Line 521: | Line 521: | ||
|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; color:black" | ||
!AZ 5214E | !AZ 5214E | ||
| 2023-04-04 | | 2023-04-04<br>jehem | ||
| 1.5 µm | | 1.5 µm | ||
| Fast | | Fast | ||
| Line 533: | Line 533: | ||
|-style="background:silver; color:black" | |-style="background:silver; color:black" | ||
!AZ 5214E<br>image reversal | !AZ 5214E<br>image reversal | ||
| 2023-04-04 | | 2023-04-04<br>jehem | ||
| 2.2 µm | | 2.2 µm | ||
| Fast | | Fast | ||