Specific Process Knowledge/Lithography/Resist/UVresist: Difference between revisions

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VisualWikitext

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 !Process flow examples
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-Mask aligner:
+Mask aligner:<br>
-[[media:‎process_flow_AZ_5214E_positive_MA6_-_2023-02.docx‎ |Process flow AZ 5214E positive‎]]
+[[media:‎process_flow_AZ_5214E_positive_MA6_-_2023-02.docx‎ |Process flow AZ 5214E positive‎ MA6]]<br>
-[[media:process_flow_AZ_5214E_IR_MA6_-_2023-02.docx‎ |Process flow AZ 5214E image reversal]]
+[[media:process_flow_AZ_5214E_IR_MA6_-_2023-02.docx‎ |Process flow AZ 5214E image reversal MA6]]
-Maskless aligner:
-[[media:‎process_flow_AZ_5214E_positive_MLA_-_2023-02.docx‎ |Process flow AZ 5214E positive‎]]
+Maskless aligner:<br>
-[[media:process_flow_AZ_5214E_IR_MLA_-_2023-02.docx‎ |Process flow AZ 5214E image reversal]]
+[[media:‎process_flow_AZ_5214E_positive_MLA_-_2023-02.docx‎ |Process flow AZ 5214E positive‎ MLA]]<br>
+[[media:process_flow_AZ_5214E_IR_MLA_-_2023-02.docx‎ |Process flow AZ 5214E image reversal MLA]]
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-Mask aligner:
+Mask aligner:<br>
-[[media:Process_Flow_AZ_MiR701.docx‎|Process_Flow_AZ_MiR701.docx‎]]
+[[media:process_flow_AZ_MiR_701_MA6_-_2023-02.docx‎|Process flow AZ MiR 701‎ MA6]]
-Maskless aligner:
+Maskless aligner:<br>
-[[media:Process_Flow_AZ_MiR701_MLA.docx‎|Process_Flow_AZ_MiR701_MLA.docx‎]]
+[[media:process_flow_AZ_MiR_701_MLA_-_2023-02.docx‎|Process flow AZ MiR 701‎ MLA]]
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-Mask aligner:
+Mask aligner:<br>
-[[media:Process_Flow_AZ_nLOF_2020.docx‎|Process_Flow_AZ_nLOF_2020.docx‎]]
+[[media:process_flow_AZ_nLOF_2020_MA6_-_2023-02.docx‎|Process flow AZ nLOF 2020‎ MA6‎]]
-Maskless aligner:
+Maskless aligner:<br>
-[[media:Process_Flow_AZ_nLOF_2020_MLA.docx‎|Process_Flow_AZ_nLOF_2020_MLA.docx‎]]
+[[media:process_flow_AZ_nLOF_2020_MLA_-_2023-02.docx‎|Process flow AZ nLOF 2020‎ MLA‎]]
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-Mask aligner:
+Mask aligner:<br>
-[[media:Process_Flow_thick_AZ4562_vers2.docx‎|Process_Flow_thick_AZ4562.docx‎]]
+[[media:process_flow_AZ_4562_MA6_-_2023-02.docx‎|Process flow AZ 4562 MA6‎]]
-Maskless aligner:
-[[media:Process_Flow_thick_AZ4562_MLA.docx‎|Process_Flow_thick_AZ4562_MLA.docx‎]]
+Maskless aligner:<br>
+[[media:process_flow_AZ_4562_MLA_-_2023-02.docx‎|Process flow AZ 4562 MLA]]
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-[[media:Process_Flow_SU8_70um.docx‎|Process_Flow_SU8_70um.docx‎]]
+Mask aligner:<br>
+[[media:process_flow_SU-8_MA6_-_2023-02.docx‎|Process flow SU-8 MA6‎]]
+Maskless aligner:<br>
+[[media:process_flow_SU-8_MLA_-_2023-02.docx‎|Process flow SU-8 MLA‎]]
-Most of the process knowledge on SU-8 is based in research groups
+NB! Most of the process knowledge on SU-8 is based in research groups
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