Specific Process Knowledge/Lithography: Difference between revisions
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*[[Specific_Process_Knowledge/Lithography/Coaters/SprayCoater|Spray Coater]] | *[[Specific_Process_Knowledge/Lithography/Coaters/SprayCoater|Spray Coater]] | ||
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'''<big>[[Specific Process Knowledge/Lithography/UVExposure|UV Exposure]]</big>''' | '''<big>[[Specific Process Knowledge/Lithography/UVExposure|UV Exposure]]</big>''' | ||
*[[Specific Process Knowledge/Lithography/UVExposure#KS Aligner|KS Aligner]] | *[[Specific Process Knowledge/Lithography/UVExposure#KS Aligner|KS Aligner]] | ||
*[[ | *[[Specific_Process_Knowledge/Lithography/UVExposure#Aligner:_MA6_-_2|Aligner: MA6-2]] | ||
*[[Specific Process Knowledge/Lithography/UVExposure#Aligner-6inch|Aligner-6inch]] | *[[Specific Process Knowledge/Lithography/UVExposure#Aligner-6inch|Aligner-6inch]] | ||
*[[Specific Process Knowledge/Lithography/UVExposure#III-V Aligner|III-V Aligner]] | *[[Specific Process Knowledge/Lithography/UVExposure#III-V Aligner|III-V Aligner]] | ||
*[[Specific Process Knowledge/Lithography/UVExposure#Inclined UV lamp|Inclined UV lamp]] | *[[Specific Process Knowledge/Lithography/UVExposure#Inclined UV lamp|Inclined UV lamp]] | ||
'''<big>[[Specific Process Knowledge/Lithography/EBeamLithography|Electron Beam Exposure]]</big>''' | '''<big>[[Specific Process Knowledge/Lithography/EBeamLithography|Electron Beam Exposure]]</big>''' | ||
*[[Specific_Process_Knowledge/Lithography/EBeamLithography/JEOL_JBX-9500FSZ|JEOL JBX-9500FSZ]] | *[[Specific_Process_Knowledge/Lithography/EBeamLithography/JEOL_JBX-9500FSZ|JEOL JBX-9500FSZ]] | ||