Jump to content

Specific Process Knowledge/Lithography/EBeamLithography: Difference between revisions

Thope (talk | contribs)
No edit summary
Thope (talk | contribs)
Line 40: Line 40:


Please request training in E-Beam lithography by sending an email with your process flow to [mailto:training@nanolab.dtu.dk training@nanolab.dtu.dk].
Please request training in E-Beam lithography by sending an email with your process flow to [mailto:training@nanolab.dtu.dk training@nanolab.dtu.dk].
==EBL staff at DTU Nanolab==
{| class="wikitable"
|+  Staff
|-
[[File:thope.png|400px]] || [[File:pxshi.png|400px]] || [[File:elelop.png|400px]] || [[File:meenadh.png|400px]]
|-
Thomas Pedersen || Peixiong Shi || Elena Lopez Aymerich || Meena Dhankhar
|}


== JEOL 9500 and Raith eLine Plus specifications ==
== JEOL 9500 and Raith eLine Plus specifications ==