Specific Process Knowledge/Lithography: Difference between revisions
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'''<big>Literature</big>''' | '''<big>Literature</big>''' | ||
*[http://onlinelibrary.wiley.com/doi/10.1002/9781119990413.ch9/pdf Franssila, 2010, Chapter 9: Optical Lithography] | *[http://onlinelibrary.wiley.com/doi/10.1002/9781119990413.ch9/pdf Franssila, 2010, Chapter 9: Optical Lithography] | ||
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*A full [https://www.youtube.com/watch?v=TdwUGOxCdUc&index=39&list=PLM2eE_hI4gSDjK4SiDbhpmpjw31Xyqfo_ lecture series] from a UT Austin course on microfabrication by "litho guru" Chris Mack. Half of the lectures are on (projection) lithography :-) | *A full [https://www.youtube.com/watch?v=TdwUGOxCdUc&index=39&list=PLM2eE_hI4gSDjK4SiDbhpmpjw31Xyqfo_ lecture series] from a UT Austin course on microfabrication by "litho guru" Chris Mack. Half of the lectures are on (projection) lithography :-) | ||
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'''<big>Lithography TPT lecture slides</big>''' | '''<big>Lithography TPT lecture slides</big>''' | ||
*[[:Media:Litho_Tool_Package_-_Introduction.pdf|TPT slides: Introduction]] | *[[:Media:Litho_Tool_Package_-_Introduction.pdf|TPT slides: Introduction]] | ||
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*[[:Media:Litho_Tool_Package_-_Process_effects_and_examples.pdf|TPT slides: Process Effects and Examples]] | *[[:Media:Litho_Tool_Package_-_Process_effects_and_examples.pdf|TPT slides: Process Effects and Examples]] | ||
'''<big>Training videos</big>''' | '''<big>Training videos</big>''' | ||
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*[https://www.youtube.com/watch?v=fs9DRH0Eo3k Training Video: Automatic Puddle Developer] | *[https://www.youtube.com/watch?v=fs9DRH0Eo3k Training Video: Automatic Puddle Developer] | ||
*[https://www.youtube.com/watch?v=btinNzYnLnY Training Video: Manual Puddle Developer] | *[https://www.youtube.com/watch?v=btinNzYnLnY Training Video: Manual Puddle Developer] | ||
Playlists on YouTube: | '''Playlists on YouTube:''' | ||
*[https://www.youtube.com/watch?v=3JhM3rmLVpA&list=PLjWVU97LayHCX4sz2AH_YiPbNRmkrBYe5 Lithography TPT training videos] | *[https://www.youtube.com/watch?v=3JhM3rmLVpA&list=PLjWVU97LayHCX4sz2AH_YiPbNRmkrBYe5 Lithography TPT training videos] | ||
*[https://www.youtube.com/watch?v=3JhM3rmLVpA&list=PLjWVU97LayHAiCabstMfAUeeWyQoQI_cV Maskless aligner training videos] | *[https://www.youtube.com/watch?v=3JhM3rmLVpA&list=PLjWVU97LayHAiCabstMfAUeeWyQoQI_cV Maskless aligner training videos] | ||
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'''<big>Manuals</big>''' | '''<big>Manuals</big>''' | ||
*Automatic Spin Coater: [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=359 Spin Coater: Gamma UV] | *Automatic Spin Coater: [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=359 Spin Coater: Gamma UV] | ||
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*Manual E-beam Developer: [http://labmanager.dtu.dk/d4Show.php?id=5070&mach=341 Developer: E-beam Manual] | *Manual E-beam Developer: [http://labmanager.dtu.dk/d4Show.php?id=5070&mach=341 Developer: E-beam Manual] | ||
'''<big>Process Flows</big>''' | '''<big>Process Flows</big>''' | ||
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*[[Specific_Process_Knowledge/Lithography/UVLithography#Resist_Overview|UV resist process flows]] | *[[Specific_Process_Knowledge/Lithography/UVLithography#Resist_Overview|UV resist process flows]] | ||
*[[Specific_Process_Knowledge/Lithography/EBeamLithography#E-beam_resists_and_Process_flow|E-beam resist process flows]] | *[[Specific_Process_Knowledge/Lithography/EBeamLithography#E-beam_resists_and_Process_flow|E-beam resist process flows]] | ||
'''<big>Electron Beam Exposure</big>''' | '''<big>Electron Beam Exposure</big>''' | ||
*[[Specific_Process_Knowledge/Lithography/EBeamLithography/JEOL_JBX-9500FSZ#Getting_started|Training on JEOL JBX-9500FSZ]] | *[[Specific_Process_Knowledge/Lithography/EBeamLithography/JEOL_JBX-9500FSZ#Getting_started|Training on JEOL JBX-9500FSZ]] | ||
*[[:File:Lecture E-beam Lithography -LGPE.pdf|Lecture on E-beam Lithography]] | *[[:File:Lecture E-beam Lithography -LGPE.pdf|Lecture on E-beam Lithography]] | ||
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Revision as of 12:19, 30 January 2023
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There are four different types of lithography available at DTU Nanolab:
Comparing lithography methods at DTU Nanolab
UV Lithography | DUV Stepper Lithography | E-beam Lithography | Nano Imprint Lithography | |
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Generel description | Pattern transfer via UltraViolet (UV) light | Pattern transfer via Deep UltraViolet (DUV) light | Patterning by electron beam | Pattern transfer via hot embossing (HE) |
Pattern size range |
~0.6 µm and up |
~200 nm and up |
~12 nm - 1 µm |
~20 nm and up |
Resist type |
UV sensitive:
|
DUV sensitive
|
E-beam sensitive
|
Imprint polymers:
|
Resist thickness range |
~0.5 µm to 200 µm |
~50 nm to 2 µm |
~30 nm to 1 µm |
~ 100 nm to 2 µm |
Typical exposure time |
10 s - 3 min pr. wafer using mask aligners |
Process dependent:
Throughput is up to 60 wafers/hour |
Process dependent:
time [s] = Q*a/I |
Process dependent, including heating/cooling rates |
Substrate size |
|
|
We have cassettes fitting:
Only one cassette can be loaded at a time |
|
Allowed materials |
Any standard cleanroom material |
Any standard cleanroom material |
Any standard cleanroom material, except:
|
Any standard cleanroom material |
Equipment Pages
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Lithography Tool Package Training
DTU Nanolab offers a Tool Package Training in Lithography; the course includes theory on lithographic processes and equipment. After the TPT has been successfully completed, you can begin training on the lithography equipment at DTU Nanolab.
You are required to pass this course, in order to get access to using the lithography equipment inside the DTU Nanolab fabrication facility (The Cleanroom).
For details, dates, and course material, please check the course description under Courses.
Lithography Tool Package Training | |
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Signing up for the course |
The course is in DTU Learn. You sign up for the course by enroling yourself in the course "DTU Nanolab TPT: Lithography".
Select the course "DTU Nanolab TPT: Lithography"
|
Learning Objectives |
Learn about the fundamentals of lithographic processing in a cleanroom:
|
Knowledge and Information about Lithography