Specific Process Knowledge/Lithography/EBeamLithography/EBLLandingpage: Difference between revisions
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|Standard positive resist, very similar to ZEP520. | |Standard positive resist, very similar to ZEP520. | ||
|[https://www.allresist.com/wp-content/uploads/sites/2/2020/03/AR-P6200_CSAR62english_Allresist_product-information.pdf AR-P 6200 info] | |[https://www.allresist.com/wp-content/uploads/sites/2/2020/03/AR-P6200_CSAR62english_Allresist_product-information.pdf AR-P 6200 info] | ||
|Gamma E-beam | |[[Specific_Process_Knowledge/Lithography/Coaters#Spin Coater: Gamma E-beam and UV|Spin Coater: Gamma E-beam and UV]] or [[Specific_Process_Knowledge/Lithography/Coaters#Manual_Spin_Coaters|Spin Coater: LabSpin 02/03]] | ||
|Anisole | |Anisole | ||
| | | | ||
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|Both e-beam and DUV sensitive resist. | |Both e-beam and DUV sensitive resist. | ||
|[https://www.allresist.com/wp-content/uploads/sites/2/2020/03/SXAR-N8200-1_english_Allresist_product_information.pdf AR-N 8200 info] | |[https://www.allresist.com/wp-content/uploads/sites/2/2020/03/SXAR-N8200-1_english_Allresist_product_information.pdf AR-N 8200 info] | ||
| | |[[Specific_Process_Knowledge/Lithography/Coaters#Manual_Spin_Coaters|Spin Coater: LabSpin 02/03]] | ||
|AR 600-07 | |AR 600-07 | ||
|AR 300-47:DIW (1:1) | |AR 300-47:DIW (1:1) | ||
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|Both e-beam, DUV and UV-sensitive resist. | |Both e-beam, DUV and UV-sensitive resist. | ||
|[https://www.allresist.com/wp-content/uploads/sites/2/2020/03/AR-N7500_english_Allresist_product-information.pdf AR-N 7500 info] | |[https://www.allresist.com/wp-content/uploads/sites/2/2020/03/AR-N7500_english_Allresist_product-information.pdf AR-N 7500 info] | ||
| | |[[Specific_Process_Knowledge/Lithography/Coaters#Manual_Spin_Coaters|Spin Coater: LabSpin 02/03]] | ||
|PGMEA | |PGMEA | ||
| | | | ||