Specific Process Knowledge/Lithography/UVLithography: Difference between revisions
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[[Specific_Process_Knowledge/Lithography/Development#Developer_TMAH_UV-lithography|AZ 726 MIF developer]] | [[Specific_Process_Knowledge/Lithography/Development#Developer_TMAH_UV-lithography|AZ 726 MIF developer]] | ||
|DI water | |DI water | ||
|Acetone | |Acetone or Remover 1165 | ||
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Mask aligner: | Mask aligner: | ||
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[[Specific_Process_Knowledge/Lithography/Development#Developer_TMAH_UV-lithography|AZ 726 MIF developer]] | [[Specific_Process_Knowledge/Lithography/Development#Developer_TMAH_UV-lithography|AZ 726 MIF developer]] | ||
|DI water | |DI water | ||
|Acetone | |Acetone or Remover 1165 | ||
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Mask aligner: | Mask aligner: | ||
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|[[Specific_Process_Knowledge/Lithography/Development#Developer_TMAH_UV-lithography|AZ 726 MIF developer]] | |[[Specific_Process_Knowledge/Lithography/Development#Developer_TMAH_UV-lithography|AZ 726 MIF developer]] | ||
|DI water | |DI water | ||
|Remover 1165 | |Acetone or Remover 1165 | ||
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Mask aligner: | Mask aligner: | ||
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|[[Specific_Process_Knowledge/Lithography/Development#SU8-Developer|mr-Dev 600 developer (PGMEA)]] | |[[Specific_Process_Knowledge/Lithography/Development#SU8-Developer|mr-Dev 600 developer (PGMEA)]] | ||
|IPA | |IPA | ||
|Plasma ashing can remove crosslinked SU-8 | |Cured SU-8 is practically insoluble. | ||
Plasma ashing can remove crosslinked SU-8. | |||
|[[media:Process_Flow_SU8_70um.docx|Process_Flow_SU8_70um.docx]] | |[[media:Process_Flow_SU8_70um.docx|Process_Flow_SU8_70um.docx]] | ||