Specific Process Knowledge/Lithography/UVLithography: Difference between revisions

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 Maskless aligner ([[Specific_Process_Knowledge/Lithography/UVExposure#Aligner:_Maskless_01|01]], [[Specific_Process_Knowledge/Lithography/UVExposure#Aligner:_Maskless_02|02]] or [[Specific_Process_Knowledge/Lithography/UVExposure#Aligner:_Maskless_03|03]])
-|[[Specific_Process_Knowledge/Lithography/Development#Developer-6inch|AZ 351B developer]]
+|AZ 351B developer
 or
@@ Line 117: / Line 116: @@
 Maskless aligner ([[Specific_Process_Knowledge/Lithography/UVExposure#Aligner:_Maskless_01|01]] or [[Specific_Process_Knowledge/Lithography/UVExposure#Aligner:_Maskless_03|03]])
-|[[Specific_Process_Knowledge/Lithography/Development#Developer-6inch|AZ 351B developer]]
+|AZ 351B developer
 or
@@ Line 124: / Line 122: @@
 |DI water
 |Acetone
-|[[media:Process_Flow_thick_AZ4562_vers2.docx‎|Process_Flow_thick_AZ4562.docx‎]]
+|Mask aligner:
+[[media:Process_Flow_thick_AZ4562_vers2.docx‎|Process_Flow_thick_AZ4562.docx‎]]
+Maskless aligner:
+[[media:Process_Flow_thick_AZ4562_MLA.docx‎|Process_Flow_thick_AZ4562_MLA.docx‎]]
 |-
@@ Line 149: / Line 151: @@
 |DI water
 |Remover 1165
-|[[media:Process_Flow_AZ_MiR701.docx‎|Process_Flow_AZ_MiR701.docx‎]]
+|Mask aligner:
+[[media:Process_Flow_AZ_MiR701.docx‎|Process_Flow_AZ_MiR701.docx‎]]
+Maskless aligner:
+[[media:Process_Flow_AZ_MiR701_MLA.docx‎|Process_Flow_AZ_MiR701_MLA.docx‎]]
 |-
@@ Line 174: / Line 180: @@
 |DI water
 |Remover 1165
-|[[media:Process_Flow_AZ_nLOF_2020.docx‎|Process_Flow_AZ_nLOF_2020.docx‎]]
+|Mask aligner:
+[[media:Process_Flow_AZ_nLOF_2020.docx‎|Process_Flow_AZ_nLOF_2020.docx‎]]
+Maskless aligner:
+[[media:Process_Flow_AZ_nLOF_2020_MLA.docx‎|Process_Flow_AZ_nLOF_2020_MLA.docx‎]]
 |-
@@ Line 198: / Line 208: @@
 |}
 '''Other process flows:'''