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Specific Process Knowledge/Lithography/UVLithography: Difference between revisions

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Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,528 edits
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Supplied by [https://www.microchemicals.com/ MicroChemicals GmbH]
Supplied by [https://www.microchemicals.com/ MicroChemicals GmbH]
|Can be used for both positive and reverse processes with resist thickness between 1 and 4 µm.
|Can be used for both positive and image reversed (negative) processes with resist thickness between 1 and 4 µm.
|[[media:AZ5214E.pdf‎|AZ5214E.pdf‎]]
|[[media:AZ5214E.pdf‎|AZ5214E.pdf‎]]


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