Specific Process Knowledge/Lithography/UVLithography: Difference between revisions
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[[Specific_Process_Knowledge/Lithography/Coaters#Spin_Coater:_RCD8|Spin Coater: RCD8]] | [[Specific_Process_Knowledge/Lithography/Coaters#Spin_Coater:_RCD8|Spin Coater: RCD8]] | ||
|[[Specific_Process_Knowledge/Lithography/UVExposure#KS_Aligner|KS Aligner]] | |Mask aligner ([[Specific_Process_Knowledge/Lithography/UVExposure#KS_Aligner|KS]] or [[Specific_Process_Knowledge/Lithography/UVExposure#Aligner:_MA6_-_2|MA6 - 2]]) | ||
[[Specific_Process_Knowledge/Lithography/UVExposure#Aligner: | Maskless aligner ([[Specific_Process_Knowledge/Lithography/UVExposure#Aligner:_Maskless_01|01]], [[Specific_Process_Knowledge/Lithography/UVExposure#Aligner:_Maskless_02|02]] or [[Specific_Process_Knowledge/Lithography/UVExposure#Aligner:_Maskless_03|03]]) | ||
[[Specific_Process_Knowledge/Lithography/UVExposure#Aligner | |||
|[[Specific_Process_Knowledge/Lithography/Development#Developer-6inch|AZ 351B developer]] | |[[Specific_Process_Knowledge/Lithography/Development#Developer-6inch|AZ 351B developer]] | ||
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[[Specific_Process_Knowledge/Lithography/Coaters#Spin_Coater:_RCD8|Spin Coater: RCD8]] | [[Specific_Process_Knowledge/Lithography/Coaters#Spin_Coater:_RCD8|Spin Coater: RCD8]] | ||
|[[Specific_Process_Knowledge/Lithography/UVExposure#KS_Aligner|KS Aligner]] | |Mask aligner ([[Specific_Process_Knowledge/Lithography/UVExposure#KS_Aligner|KS]] or [[Specific_Process_Knowledge/Lithography/UVExposure#Aligner:_MA6_-_2|MA6 - 2]]) | ||
[[Specific_Process_Knowledge/Lithography/UVExposure#Aligner: | Maskless aligner ([[Specific_Process_Knowledge/Lithography/UVExposure#Aligner:_Maskless_01|01]] or [[Specific_Process_Knowledge/Lithography/UVExposure#Aligner:_Maskless_03|03]]) | ||
[[Specific_Process_Knowledge/Lithography/UVExposure#Aligner | |||
|[[Specific_Process_Knowledge/Lithography/Development#Developer-6inch|AZ 351B developer]] | |[[Specific_Process_Knowledge/Lithography/Development#Developer-6inch|AZ 351B developer]] | ||
| Line 150: | Line 146: | ||
[[Specific_Process_Knowledge/Lithography/Coaters#Spin_Coater:_RCD8|Spin Coater: RCD8]] | [[Specific_Process_Knowledge/Lithography/Coaters#Spin_Coater:_RCD8|Spin Coater: RCD8]] | ||
|[[Specific_Process_Knowledge/Lithography/UVExposure#KS_Aligner|KS Aligner]] | |Mask aligner ([[Specific_Process_Knowledge/Lithography/UVExposure#KS_Aligner|KS]] or [[Specific_Process_Knowledge/Lithography/UVExposure#Aligner:_MA6_-_2|MA6 - 2]]) | ||
[[Specific_Process_Knowledge/Lithography/UVExposure#Aligner: | Maskless aligner ([[Specific_Process_Knowledge/Lithography/UVExposure#Aligner:_Maskless_01|01]], [[Specific_Process_Knowledge/Lithography/UVExposure#Aligner:_Maskless_02|02]] or [[Specific_Process_Knowledge/Lithography/UVExposure#Aligner:_Maskless_03|03]]) | ||
[[Specific_Process_Knowledge/Lithography/UVExposure#Aligner | |||
|[[Specific_Process_Knowledge/Lithography/Development#Developer_TMAH_UV-lithography|AZ 726 MIF developer]] | |[[Specific_Process_Knowledge/Lithography/Development#Developer_TMAH_UV-lithography|AZ 726 MIF developer]] | ||
|DI water | |DI water | ||
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[[Specific_Process_Knowledge/Lithography/Coaters#Spin_Coater:_RCD8|Spin Coater: RCD8]] | [[Specific_Process_Knowledge/Lithography/Coaters#Spin_Coater:_RCD8|Spin Coater: RCD8]] | ||
|[[Specific_Process_Knowledge/Lithography/UVExposure#KS_Aligner|KS Aligner]] | |Mask aligner ([[Specific_Process_Knowledge/Lithography/UVExposure#KS_Aligner|KS]] or [[Specific_Process_Knowledge/Lithography/UVExposure#Aligner:_MA6_-_2|MA6 - 2]]) | ||
[[Specific_Process_Knowledge/Lithography/UVExposure#Aligner: | Maskless aligner ([[Specific_Process_Knowledge/Lithography/UVExposure#Aligner:_Maskless_01|01]] or [[Specific_Process_Knowledge/Lithography/UVExposure#Aligner:_Maskless_02|02]]) | ||
[[Specific_Process_Knowledge/Lithography/UVExposure#Aligner | |||
|[[Specific_Process_Knowledge/Lithography/Development#Developer_TMAH_UV-lithography|AZ 726 MIF developer]] | |[[Specific_Process_Knowledge/Lithography/Development#Developer_TMAH_UV-lithography|AZ 726 MIF developer]] | ||
|DI water | |DI water | ||
| Line 204: | Line 196: | ||
[[Specific_Process_Knowledge/Lithography/Coaters#Manual_Spin_Coaters|Spin Coater: Manual All Resists]] | [[Specific_Process_Knowledge/Lithography/Coaters#Manual_Spin_Coaters|Spin Coater: Manual All Resists]] | ||
|[[Specific_Process_Knowledge/Lithography/UVExposure#Aligner- | |Mask aligner ([[Specific_Process_Knowledge/Lithography/UVExposure#KS_Aligner|KS]] or [[Specific_Process_Knowledge/Lithography/UVExposure#Aligner:_MA6_-_2|MA6 - 2]]) | ||
Maskless aligner ([[Specific_Process_Knowledge/Lithography/UVExposure#Aligner:_Maskless_01|01]] or [[Specific_Process_Knowledge/Lithography/UVExposure#Aligner:_Maskless_02|02]]) | |||
|[[Specific_Process_Knowledge/Lithography/Development#SU8-Developer|mr-Dev 600 developer (PGMEA)]] | |[[Specific_Process_Knowledge/Lithography/Development#SU8-Developer|mr-Dev 600 developer (PGMEA)]] | ||
|IPA | |IPA | ||