Specific Process Knowledge/Lithography/UVLithography: Difference between revisions
| Line 185: | Line 185: | ||
[[Specific_Process_Knowledge/Lithography/Coaters#Manual_Spin_Coaters|Spin Coater: Manual All Resists]] | [[Specific_Process_Knowledge/Lithography/Coaters#Manual_Spin_Coaters|Spin Coater: Manual All Resists]] | ||
|[[Specific_Process_Knowledge/Lithography/UVExposure#Aligner-6inch|Aligner: 6inch | |[[Specific_Process_Knowledge/Lithography/UVExposure#Aligner-6inch|Aligner: 6inch]] | ||
|[[Specific_Process_Knowledge/Lithography/Development#SU8-Developer|mr-Dev 600 developer (PGMEA)]] | |[[Specific_Process_Knowledge/Lithography/Development#SU8-Developer|mr-Dev 600 developer (PGMEA)]] | ||
|IPA | |IPA | ||