Specific Process Knowledge/Lithography/UVLithography: Difference between revisions
Appearance
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|[[Specific_Process_Knowledge/Lithography/Coaters#Spin_Coater:_Gamma_UV|Spin Coater: Gamma UV]], | |[[Specific_Process_Knowledge/Lithography/Coaters#Spin_Coater:_Gamma_UV|Spin Coater: Gamma UV]], | ||
[[Specific_Process_Knowledge/Lithography/Coaters# | [[Specific_Process_Knowledge/Lithography/Coaters#Manual_Spin_Coaters|A manual spin coater]] or | ||
[[Specific_Process_Knowledge/Lithography/Coaters# | [[Specific_Process_Knowledge/Lithography/Coaters#Spin_Coater:_RCD8|Spin Coater: RCD8]] | ||
|[[Specific_Process_Knowledge/Lithography/UVExposure#KS_Aligner|KS Aligner]], | |[[Specific_Process_Knowledge/Lithography/UVExposure#KS_Aligner|KS Aligner]], | ||
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|[[Specific_Process_Knowledge/Lithography/Coaters#Spin_Coater:_Gamma_UV|Spin Coater: Gamma UV]], | |[[Specific_Process_Knowledge/Lithography/Coaters#Spin_Coater:_Gamma_UV|Spin Coater: Gamma UV]], | ||
[[Specific_Process_Knowledge/Lithography/Coaters#Spin Track 1 + 2|Spin Track 1 + 2]] or | [[Specific_Process_Knowledge/Lithography/Coaters#Spin Track 1 + 2|Spin Track 1 + 2]], | ||
[[Specific_Process_Knowledge/Lithography/Coaters#Manual_Spin_Coaters|A manual spin coater]] or | |||
[[Specific_Process_Knowledge/Lithography/Coaters#Spin_Coater:_RCD8|Spin Coater: RCD8]] | [[Specific_Process_Knowledge/Lithography/Coaters#Spin_Coater:_RCD8|Spin Coater: RCD8]] | ||
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|[[Specific_Process_Knowledge/Lithography/Coaters#Spin_Coater:_Gamma_UV|Spin Coater: Gamma UV]]; | |[[Specific_Process_Knowledge/Lithography/Coaters#Spin_Coater:_Gamma_UV|Spin Coater: Gamma UV]]; | ||
[[Specific_Process_Knowledge/Lithography/Coaters#Spin Track 1 + 2|Spin Track 1 + 2]] or | [[Specific_Process_Knowledge/Lithography/Coaters#Spin Track 1 + 2|Spin Track 1 + 2]], | ||
[[Specific_Process_Knowledge/Lithography/Coaters#Manual_Spin_Coaters|A manual spin coater]] or | |||
[[Specific_Process_Knowledge/Lithography/Coaters#Spin_Coater:_RCD8|Spin Coater: RCD8]] | [[Specific_Process_Knowledge/Lithography/Coaters#Spin_Coater:_RCD8|Spin Coater: RCD8]] | ||
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|[[media:SU-8_DataSheet_2005.pdf|SU-8_DataSheet_2005.pdf]], [[media:SU-8_DataSheet_2075.pdf|SU-8_DataSheet_2075.pdf]] | |[[media:SU-8_DataSheet_2005.pdf|SU-8_DataSheet_2005.pdf]], [[media:SU-8_DataSheet_2075.pdf|SU-8_DataSheet_2075.pdf]] | ||
|[[Specific_Process_Knowledge/Lithography/Coaters|???]] | |[[Specific_Process_Knowledge/Lithography/Coaters|???]] | ||
|[[Specific_Process_Knowledge/Lithography/UVExposure#Aligner-6inch|Aligner | |[[Specific_Process_Knowledge/Lithography/UVExposure#Aligner-6inch|Aligner: 6inch]], | ||
[[Specific_Process_Knowledge/Lithography/UVExposure#KS_Aligner|KS Aligner]] or | [[Specific_Process_Knowledge/Lithography/UVExposure#KS_Aligner|KS Aligner]] or | ||