Specific Process Knowledge/Lithography/UVLithography: Difference between revisions
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[[Specific_Process_Knowledge/Lithography/Coaters#Spin_Coater:_RCD8|Spin Coater: RCD8]] or | [[Specific_Process_Knowledge/Lithography/Coaters#Spin_Coater:_RCD8|Spin Coater: RCD8]] or | ||
[[Specific_Process_Knowledge/Lithography/Coaters#Manual_Spin_Coaters| | [[Specific_Process_Knowledge/Lithography/Coaters#Manual_Spin_Coaters|A manual spin coater]] | ||
|[[Specific_Process_Knowledge/Lithography/UVExposure#KS_Aligner|KS Aligner]], | |[[Specific_Process_Knowledge/Lithography/UVExposure#KS_Aligner|KS Aligner]], | ||
[[Specific_Process_Knowledge/Lithography/UVExposure#Aligner:_MA6_-_2|Aligner: MA6 - 2]] or | [[Specific_Process_Knowledge/Lithography/UVExposure#Aligner:_MA6_-_2|Aligner: MA6 - 2]] or | ||
[[Specific_Process_Knowledge/Lithography/UVExposure#Aligner-6inch|Aligner | [[Specific_Process_Knowledge/Lithography/UVExposure#Aligner-6inch|Aligner: 6inch]] | ||
|[[Specific_Process_Knowledge/Lithography/Development#Developer-6inch|AZ 351B developer]] | |[[Specific_Process_Knowledge/Lithography/Development#Developer-6inch|AZ 351B developer]] | ||
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|For process with resist thickness between 6 and 25 µm. | |For process with resist thickness between 6 and 25 µm. | ||
|[[media:AZ4500.pdf|AZ4500.pdf]] | |[[media:AZ4500.pdf|AZ4500.pdf]] | ||
|[[Specific_Process_Knowledge/Lithography/Coaters#SSE Spinner|SSE]] | |[[Specific_Process_Knowledge/Lithography/Coaters#SSE Spinner|SSE]], | ||
[[Specific_Process_Knowledge/Lithography/Coaters# | [[Specific_Process_Knowledge/Lithography/Coaters#Manual_Spin_Coaters|A manual spin coater]] or | ||
[[Specific_Process_Knowledge/Lithography/Coaters#Spin_Coater:_RCD8|Spin Coater: RCD8]] | |||
|[[Specific_Process_Knowledge/Lithography/UVExposure#KS_Aligner|KS Aligner]], | |[[Specific_Process_Knowledge/Lithography/UVExposure#KS_Aligner|KS Aligner]], | ||
[[Specific_Process_Knowledge/Lithography/UVExposure#Aligner:_MA6_-_2|Aligner: MA6 - 2]] or | [[Specific_Process_Knowledge/Lithography/UVExposure#Aligner:_MA6_-_2|Aligner: MA6 - 2]] or | ||
[[Specific_Process_Knowledge/Lithography/UVExposure#Aligner-6inch|Aligner | [[Specific_Process_Knowledge/Lithography/UVExposure#Aligner-6inch|Aligner: 6inch]] | ||
|[[Specific_Process_Knowledge/Lithography/Development#Developer-6inch|AZ 351B developer]] | |[[Specific_Process_Knowledge/Lithography/Development#Developer-6inch|AZ 351B developer]] | ||
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Resist thickness 1 - 2 µm. | Resist thickness 1 - 2 µm. | ||
|[[media:AZ_MiR_701.pdf|AZ_MiR_701.pdf]] | |[[media:AZ_MiR_701.pdf|AZ_MiR_701.pdf]] | ||
|[[Specific_Process_Knowledge/Lithography/Coaters#Spin Track 1 + 2|Spin Track 1 + 2]] | |[[Specific_Process_Knowledge/Lithography/Coaters#Spin_Coater:_Gamma_UV|Spin Coater: Gamma UV]], | ||
[[Specific_Process_Knowledge/Lithography/Coaters#Spin Track 1 + 2|Spin Track 1 + 2]] or | |||
[[Specific_Process_Knowledge/Lithography/Coaters#Spin_Coater:_RCD8|Spin Coater: RCD8]] | |||
|[[Specific_Process_Knowledge/Lithography/UVExposure#KS_Aligner|KS Aligner]], | |[[Specific_Process_Knowledge/Lithography/UVExposure#KS_Aligner|KS Aligner]], | ||
[[Specific_Process_Knowledge/Lithography/UVExposure#Aligner:_MA6_-_2|Aligner: MA6 - 2]] or | [[Specific_Process_Knowledge/Lithography/UVExposure#Aligner:_MA6_-_2|Aligner: MA6 - 2]] or | ||
[[Specific_Process_Knowledge/Lithography/UVExposure#Aligner-6inch|Aligner | [[Specific_Process_Knowledge/Lithography/UVExposure#Aligner-6inch|Aligner: 6inch]] | ||
|[[Specific_Process_Knowledge/Lithography/Development#Developer_TMAH_UV-lithography|AZ 726 MIF developer]] | |[[Specific_Process_Knowledge/Lithography/Development#Developer_TMAH_UV-lithography|AZ 726 MIF developer]] | ||
|DI water | |DI water | ||
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Resist thickness 1.5 - 3 µm. | Resist thickness 1.5 - 3 µm. | ||
|[[media:AZ_nLOF_2020.pdf|AZ_nLOF_2020.pdf]] | |[[media:AZ_nLOF_2020.pdf|AZ_nLOF_2020.pdf]] | ||
|[[Specific_Process_Knowledge/Lithography/Coaters#Spin Track 1 + 2|Spin Track 1 + 2]] | |[[Specific_Process_Knowledge/Lithography/Coaters#Spin_Coater:_Gamma_UV|Spin Coater: Gamma UV]]; | ||
[[Specific_Process_Knowledge/Lithography/Coaters#Spin Track 1 + 2|Spin Track 1 + 2]] or | |||
[[Specific_Process_Knowledge/Lithography/Coaters#Spin_Coater:_RCD8|Spin Coater: RCD8]] | |||
|[[Specific_Process_Knowledge/Lithography/UVExposure#KS_Aligner|KS Aligner]], | |[[Specific_Process_Knowledge/Lithography/UVExposure#KS_Aligner|KS Aligner]], | ||
[[Specific_Process_Knowledge/Lithography/UVExposure#Aligner:_MA6_-_2|Aligner: MA6 - 2]] or | [[Specific_Process_Knowledge/Lithography/UVExposure#Aligner:_MA6_-_2|Aligner: MA6 - 2]] or | ||
[[Specific_Process_Knowledge/Lithography/UVExposure#Aligner-6inch|Aligner | [[Specific_Process_Knowledge/Lithography/UVExposure#Aligner-6inch|Aligner: 6inch]] | ||
|[[Specific_Process_Knowledge/Lithography/Development#Developer_TMAH_UV-lithography|AZ 726 MIF developer]] | |[[Specific_Process_Knowledge/Lithography/Development#Developer_TMAH_UV-lithography|AZ 726 MIF developer]] | ||
|DI water | |DI water | ||