Specific Process Knowledge/Lithography/UVLithography: Difference between revisions
| Line 162: | Line 162: | ||
|- | |- | ||
|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; color:black" | ||
|'''SU-8''' | |'''[[Specific Process Knowledge/Lithography/SU-8|SU-8]]''' | ||
|Negative | |Negative | ||
|350 - 400 nm | |350 - 400 nm | ||
| Line 170: | Line 170: | ||
Resist thickness 1 µm to several 100 µm. | Resist thickness 1 µm to several 100 µm. | ||
|[[media:SU-8_DataSheet_2005.pdf|SU-8_DataSheet_2005.pdf]], [[media:SU-8_DataSheet_2075.pdf|SU-8_DataSheet_2075.pdf]] | |[[media:SU-8_DataSheet_2005.pdf|SU-8_DataSheet_2005.pdf]], [[media:SU-8_DataSheet_2075.pdf|SU-8_DataSheet_2075.pdf]] | ||
|[[Specific_Process_Knowledge/Lithography/Coaters | |[[Specific_Process_Knowledge/Lithography/Coaters|???]] | ||
|[[Specific_Process_Knowledge/Lithography/UVExposure#Aligner-6inch|Aligner-6inch]], | |[[Specific_Process_Knowledge/Lithography/UVExposure#Aligner-6inch|Aligner-6inch]], | ||