Specific Process Knowledge/Lithography/UVLithography: Difference between revisions
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* '''Development''': Choose which equipment you wish to use to develop your photoresist from [[Specific_Process_Knowledge/Lithography/Development|this]] list. | * '''Development''': Choose which equipment you wish to use to develop your photoresist from [[Specific_Process_Knowledge/Lithography/Development|this]] list. | ||
[[File:UVLPic2.png| | [[File:UVLPic2.png|200px|right]] | ||
* '''Specify whether you wish to strip or lift-off your resist''': [[Specific_Process_Knowledge/Lithography/Strip|strip]] and [[Specific_Process_Knowledge/Lithography/LiftOff|lift-off]]. | * '''Specify whether you wish to strip or lift-off your resist''': [[Specific_Process_Knowledge/Lithography/Strip|strip]] and [[Specific_Process_Knowledge/Lithography/LiftOff|lift-off]]. | ||