Specific Process Knowledge/Lithography/UVLithography: Difference between revisions
| Line 37: | Line 37: | ||
|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; color:black" | ||
|'''AZ 5214E''' | |'''AZ 5214E''' | ||
|Positive but can be reversed | |Positive but the image can be reversed | ||
|[http://www.azem.com/en/Products/Litho-technology/Photoresists.aspx AZ Electronic Materials] | |[http://www.azem.com/en/Products/Litho-technology/Photoresists.aspx AZ Electronic Materials] | ||
|Can be used for both positive and reverse processes with resist thickness between 1 | |Can be used for both positive and reverse processes with resist thickness between 1 and 4 µm. | ||
|[[media:AZ5214E.pdf|AZ5214E.pdf]] | |[[media:AZ5214E.pdf|AZ5214E.pdf]] | ||
|[[Specific_Process_Knowledge/Lithography/Coaters#SSE Spinner|SSE]], | |[[Specific_Process_Knowledge/Lithography/Coaters#SSE Spinner|SSE]], | ||
| Line 73: | Line 73: | ||
|Positive | |Positive | ||
|[http://www.azem.com/en/Products/Litho-technology/Photoresists.aspx AZ Electronic Materials] | |[http://www.azem.com/en/Products/Litho-technology/Photoresists.aspx AZ Electronic Materials] | ||
|For process with resist thickness between 6 and | |For process with resist thickness between 6 and 25 µm. | ||
|[[media:AZ4500.pdf|AZ4500.pdf]] | |[[media:AZ4500.pdf|AZ4500.pdf]] | ||
|[[Specific_Process_Knowledge/Lithography/Coaters#SSE Spinner|SSE]] or | |[[Specific_Process_Knowledge/Lithography/Coaters#SSE Spinner|SSE]] or | ||