Specific Process Knowledge/Lithography/UVLithography: Difference between revisions
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|'''Technical reports''' | |'''Technical reports''' | ||
|'''[[Specific_Process_Knowledge/Lithography/Coaters|Spin Coating]]''' | |'''[[Specific_Process_Knowledge/Lithography/Coaters|Spin Coating]]''' | ||
|'''[[Specific_Process_Knowledge/Lithography/UVExposure|Exposure]]''' | |'''[[Specific_Process_Knowledge/Lithography/UVExposure|Exposure dose]]''' | ||
|'''[[Specific_Process_Knowledge/Lithography/Development|Developer]]''' | |'''[[Specific_Process_Knowledge/Lithography/Development|Developer]]''' | ||
|'''Rinse''' | |'''Rinse''' | ||
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|[[media:AZ5214E.pdf|AZ5214E.pdf]] | |[[media:AZ5214E.pdf|AZ5214E.pdf]] | ||
|[[Specific_Process_Knowledge/Lithography/Coaters#SSE Spinner|SSE]], [[Specific_Process_Knowledge/Lithography/Coaters#KS Spinner|KS Spinner]], [[Specific_Process_Knowledge/Lithography/Coaters#III-V Spinner|III-V Spinner]] | |[[Specific_Process_Knowledge/Lithography/Coaters#SSE Spinner|SSE]], [[Specific_Process_Knowledge/Lithography/Coaters#KS Spinner|KS Spinner]], [[Specific_Process_Knowledge/Lithography/Coaters#III-V Spinner|III-V Spinner]] | ||
|... | |||
|AZ 351B developer | |AZ 351B developer | ||
|DI water | |DI water | ||
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|[[media:AZ4500.pdf|AZ4500.pdf]] | |[[media:AZ4500.pdf|AZ4500.pdf]] | ||
|[[Specific_Process_Knowledge/Lithography/Coaters#SSE Spinner|SSE]], [[Specific_Process_Knowledge/Lithography/Coaters#KS Spinner|KS Spinner]] | |[[Specific_Process_Knowledge/Lithography/Coaters#SSE Spinner|SSE]], [[Specific_Process_Knowledge/Lithography/Coaters#KS Spinner|KS Spinner]] | ||
|... | |||
|AZ 351B developer | |AZ 351B developer | ||
|DI water | |DI water | ||
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|[[media:AZ_MiR_701.pdf|AZ_MiR_701.pdf]] | |[[media:AZ_MiR_701.pdf|AZ_MiR_701.pdf]] | ||
|[[Specific_Process_Knowledge/Lithography/Coaters#Spin Track 1 + 2|Spin Track 1 + 2]] | |[[Specific_Process_Knowledge/Lithography/Coaters#Spin Track 1 + 2|Spin Track 1 + 2]] | ||
|... | |||
|AZ 726 MIF developer | |AZ 726 MIF developer | ||
|DI water | |DI water | ||
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|[[media:AZ_nLOF_2020.pdf|AZ_nLOF_2020.pdf]] | |[[media:AZ_nLOF_2020.pdf|AZ_nLOF_2020.pdf]] | ||
|[[Specific_Process_Knowledge/Lithography/Coaters#Spin Track 1 + 2|Spin Track 1 + 2]] | |[[Specific_Process_Knowledge/Lithography/Coaters#Spin Track 1 + 2|Spin Track 1 + 2]] | ||
|... | |||
|AZ 726 MIF developer | |AZ 726 MIF developer | ||
|DI water | |DI water | ||
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|[[media:SU-8_DataSheet_2005.pdf|SU-8_DataSheet_2005.pdf]], [[media:SU-8_DataSheet_2075.pdf|SU-8_DataSheet_2075.pdf]] | |[[media:SU-8_DataSheet_2005.pdf|SU-8_DataSheet_2005.pdf]], [[media:SU-8_DataSheet_2075.pdf|SU-8_DataSheet_2075.pdf]] | ||
|[[Specific_Process_Knowledge/Lithography/Coaters#KS Spinner|KS Spinner]] | |[[Specific_Process_Knowledge/Lithography/Coaters#KS Spinner|KS Spinner]] | ||
|... | |||
|PGMEA, mr-Dev 600 developer | |PGMEA, mr-Dev 600 developer | ||
|IPA | |IPA | ||