Specific Process Knowledge/Thin film deposition: Difference between revisions
| Line 95: | Line 95: | ||
{| style="color: black;" width=" | {| style="color: black;" width="100%"; valign="top" | ||
| colspan="5" | | | colspan="5" | | ||
|- | |- | ||
| style="width: | | style="width: 30%"| | ||
{| style="color: black;" width="20%" | {| style="color: black;" width="20%"; valign="top" | ||
| colspan="1" | | | colspan="1" | | ||
|- | |- | ||
| Line 154: | Line 154: | ||
|} | |} | ||
| style="width: 20%"| | | style="width: 20%" valign="top"| | ||
===Semiconductors=== | ===Semiconductors=== | ||
*[[Specific Process Knowledge/Lithography/DUVStepper#SÜSS Spinner-Stepper|SÜSS Spinner-Stepper]] | *[[Specific Process Knowledge/Lithography/DUVStepper#SÜSS Spinner-Stepper|SÜSS Spinner-Stepper]] | ||