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Specific Process Knowledge/Lithography/EBeamLithography: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
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|style="background:LightGrey; color:black"|Minimum dwell time
|style="background:LightGrey; color:black"|Minimum dwell time
|style="background:WhiteSmoke; color:black"| 10 ns
|style="background:WhiteSmoke; color:black"| 5 ns
|style="background:WhiteSmoke; color:black"| 50 ns
|style="background:WhiteSmoke; color:black"| 50 ns
|-
|-
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