Specific Process Knowledge/Lithography/EBeamLithography/EBLLandingpage: Difference between revisions
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<div class="keywords" style="display:none;">ebl e-beam writer e-beamwriter ebeamwriter e-beamlithography</div> | <div class="keywords" style="display:none;">ebl e-beam writer e-beamwriter ebeamwriter e-beamlithography</div> | ||
= | =Electron-Beam Lithography at DTU Nanolab= | ||
DTU Nanolab has two EBL exposure systems, a JEOL JBX-9500FSZ and a Raith eLINE Plus system. The two systems are very different and new users should consult the EBL team to dertermine which system is appropriate for a particular project or type of sample. The general specifications of the two tools are given in the table below and may serve as a guideline for choice of system to use, especially the pros and cons list at the end of the table. | DTU Nanolab has two EBL exposure systems, a JEOL JBX-9500FSZ and a Raith eLINE Plus system. The two systems are very different and new users should consult the EBL team to dertermine which system is appropriate for a particular project or type of sample. The general specifications of the two tools are given in the table below and may serve as a guideline for choice of system to use, especially the pros and cons list at the end of the table. | ||