Specific Process Knowledge/Lithography/EBeamLithography: Difference between revisions
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== Proximity Error Correction (PEC) in BEAMER == | == Proximity Error Correction (PEC) in BEAMER == | ||
[[Image:BEAMER_PEC. | [[Image:BEAMER_PEC.png|500x500px|thumb|Example of dose modulated design file after Proximity Error Correction.]] | ||
BEAMER is endowed with a software that corrects for proximity errors in the e-beam exposure. You can read more about this function in the BEAMER manual [[Specific_Process_Knowledge/Lithography/EBeamLithography/BEAMER|here]] and in the BEAMER presentation here [[media:BEAMERPresentation.pdf|BEAMERPresentation.pdf]]. | BEAMER is endowed with a software that corrects for proximity errors in the e-beam exposure. You can read more about this function in the BEAMER manual [[Specific_Process_Knowledge/Lithography/EBeamLithography/BEAMER|here]] and in the BEAMER presentation here [[media:BEAMERPresentation.pdf|BEAMERPresentation.pdf]]. | ||