Jump to content

Specific Process Knowledge/Lithography/EBeamLithography: Difference between revisions

← Older editNewer edit →
VisualWikitext
Thope (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
2,179 edits
Thope (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
2,179 edits
Line 399: Line 399:
== Proximity Error Correction (PEC) in BEAMER ==
== Proximity Error Correction (PEC) in BEAMER ==


[[Image:beamer5.jpg|frame|250x250px|right]]
[[Image:BEAMER_PEC.png|frame|250x250px|right]]


BEAMER is endowed with a software that corrects for proximity errors in the e-beam exposure. You can read more about this function in the BEAMER manual [[Specific_Process_Knowledge/Lithography/EBeamLithography/BEAMER|here]] and in the BEAMER presentation here [[media:BEAMERPresentation.pdf‎|BEAMERPresentation.pdf‎]].
BEAMER is endowed with a software that corrects for proximity errors in the e-beam exposure. You can read more about this function in the BEAMER manual [[Specific_Process_Knowledge/Lithography/EBeamLithography/BEAMER|here]] and in the BEAMER presentation here [[media:BEAMERPresentation.pdf‎|BEAMERPresentation.pdf‎]].
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Lithography/EBeamLithography"