Specific Process Knowledge/Lithography/EBeamLithography: Difference between revisions

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	== E-beam resists and process guidelines ==		== E-beam resists and process guidelines ==

	DTU Nanolab offers a limited number of standard EBL resist for our users. Our standard resist and process guidelines are summarized below.		DTU Nanolab offers a limited number of standard EBL resist for our users. Our standard resist and process guidelines are summarized below. CSAR (AR-P 6200.09) is installed on Spin coater Gamma E-beam & UV for easy spin coating of 2", 4" and 6" substrates. Other substrate sizes or resist have to be used in the Labspin 2/3 coating systems.