Specific Process Knowledge/Lithography/UVLithography: Difference between revisions
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* '''Mask''': Design and order a photomask for your UV process. A detailed instruction on how to design and order a photomask can be found <u>[[Specific_Process_Knowledge/Pattern_Design|here]]</u>. | * '''Mask''': Design and order a photomask for your UV process. A detailed instruction on how to design and order a photomask can be found <u>[[Specific_Process_Knowledge/Pattern_Design|here]]</u>. | ||
* '''Development''': Choose which equipment you wish to use to develop your photoresist from <u>[[Specific_Process_Knowledge/Lithography/Development|this list]]</u>. Remember the development | * '''Development''': Choose which equipment you wish to use to develop your photoresist from <u>[[Specific_Process_Knowledge/Lithography/Development|this list]]</u>. Remember the development process influences the <u>[[Specific_Process_Knowledge/Lithography/UVExposure_Dose|exposure dose]]</u>. | ||
* '''Specify whether you wish to strip or lift-off your resist''': <u>[[Specific_Process_Knowledge/Lithography/Strip|strip]]</u> and <u>[[Specific_Process_Knowledge/Lithography/LiftOff|lift-off]]</u>. | * '''Specify whether you wish to strip or lift-off your resist''': <u>[[Specific_Process_Knowledge/Lithography/Strip|strip]]</u> and <u>[[Specific_Process_Knowledge/Lithography/LiftOff|lift-off]]</u>. | ||