Specific Process Knowledge/Lithography/UVLithography: Difference between revisions
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* '''Prepare a process flow''' which describes all steps in your UV lithography process. You can find docx-templates <u>[[Specific_Process_Knowledge/Lithography/UVLithography#Resist_Overview|in this table]]</u>. | * '''Prepare a process flow''' which describes all steps in your UV lithography process. You can find docx-templates <u>[[Specific_Process_Knowledge/Lithography/UVLithography#Resist_Overview|in this table]]</u>. | ||
* '''Substrate pretreatment''': In many processes it is recommended to < | * '''Substrate pretreatment''': In many processes it is recommended to <u>[[Specific_Process_Knowledge/Lithography/Pretreatment|pretreat or prime]]</u> your wafer before spin-coating. In some <u>[[Specific_Process_Knowledge/Lithography/Coaters|spin-coaters]]</u>, these pretreatment processes are included in the spin coating of resist. | ||
* '''Spin Coater''': Do you wish to use a manual spin coater or a robot spin coater? A manual spin coater is recommended for batches < 5 wafers. See a list of spin coaters < | * '''Spin Coater''': Do you wish to use a manual spin coater or a robot spin coater? A manual spin coater is recommended for batches < 5 wafers. See a list of spin coaters <u>[[Specific_Process_Knowledge/Lithography/Coaters|here]]</u>. | ||
* '''Resist Type''': Choose the type of resist you wish to use: a list of UV lithography resist types available at DTU Danchip can be found <u>[[Specific_Process_Knowledge/Lithography/UVLithography#Resist_Overview|on this page]]</u>. | * '''Resist Type''': Choose the type of resist you wish to use: a list of UV lithography resist types available at DTU Danchip can be found <u>[[Specific_Process_Knowledge/Lithography/UVLithography#Resist_Overview|on this page]]</u>. | ||