Specific Process Knowledge/Lithography/UVLithography: Difference between revisions
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# '''Resist Type''': Choose the type of resist you wish to use: | # '''Resist Type''': Choose the type of resist you wish to use: | ||
#* Positive tone resist: Resist exposed to UV light will be dissolved in the developer. The mask is an exact copy of the pattern which is to remain on the wafer. | #* Positive tone resist: Resist exposed to UV light will be dissolved in the developer. The mask is an exact copy of the pattern which is to remain on the wafer. | ||