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UV Lithography uses ultraviolet light to transfer a pattern from a mask to a wafer coated with photoresist.  The photoresist film is spin coated on the wafers and the pattern is transferred to the wafer by using a mask aligner. DTU Danchip houses a number of automatic or semi-automatic coaters and mask aligners.
UV Lithography uses ultraviolet light to transfer a pattern from a mask to a wafer coated with photoresist.  The photoresist film is spin coated on the wafers and the pattern is transferred to the wafer by using a mask aligner. DTU Danchip houses a number of automatic or semi-automatic coaters and mask aligners.


=Mask Design=
In order to realize your device you will need a way to draw the patterns that define the structures in the different layers on the wafer.
This is done in a drawing tool for mask layout. The output is a file you send to a mask house, which in return supplies you with a number of photolithographic masks. Each mask is a glass plate with a chromium pattern that mimics a layer in your layout.
Please read more details here: [[/Mask Design|Mask Design]]


= Resist Overview =
= Resist Overview =
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