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Specific Process Knowledge/Lithography/UVLithography: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
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Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,528 edits
Line 114: Line 114:
|'''AZ nLOF 2020'''
|'''AZ nLOF 2020'''
|Negative
|Negative
|310 - 375 nm
|310 - 380 nm
|[http://www.azem.com/en/Products/Litho-technology/Photoresists.aspx AZ Electronic Materials]
|[http://www.azem.com/en/Products/Litho-technology/Photoresists.aspx AZ Electronic Materials]
|Negative sidewalls for lift-off.
|Negative sidewalls for lift-off.
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