Specific Process Knowledge/Lithography/UVLithography: Difference between revisions
| Line 115: | Line 115: | ||
|Negative | |Negative | ||
|[http://www.azem.com/en/Products/Litho-technology/Photoresists.aspx AZ Electronic Materials] | |[http://www.azem.com/en/Products/Litho-technology/Photoresists.aspx AZ Electronic Materials] | ||
| | |Negative sidewalls for lift-off. | ||
|[[media:AZ_nLOF_2020.pdf|AZ_nLOF_2020.pdf]] | |[[media:AZ_nLOF_2020.pdf|AZ_nLOF_2020.pdf]] | ||
|[[Specific_Process_Knowledge/Lithography/Coaters#Spin Track 1 + 2|Spin Track 1 + 2]] | |[[Specific_Process_Knowledge/Lithography/Coaters#Spin Track 1 + 2|Spin Track 1 + 2]] | ||