Specific Process Knowledge/Lithography/UVLithography: Difference between revisions
| Line 41: | Line 41: | ||
|Can be used for both positive and reverse processes with resist thickness between 1 to 4um. | |Can be used for both positive and reverse processes with resist thickness between 1 to 4um. | ||
|[[media:AZ5214E.pdf|AZ5214E.pdf]] | |[[media:AZ5214E.pdf|AZ5214E.pdf]] | ||
|[[Specific_Process_Knowledge/Lithography/Coaters#SSE Spinner|SSE]], [[Specific_Process_Knowledge/Lithography/Coaters#KS Spinner|KS Spinner]] | |[[Specific_Process_Knowledge/Lithography/Coaters#SSE Spinner|SSE]], | ||
[[Specific_Process_Knowledge/Lithography/Coaters#KS Spinner|KS Spinner]] or | |||
[[Specific_Process_Knowledge/Lithography/Coaters#III-V Spinner|III-V Spinner]] | |||
|'''Positive process:''' | |'''Positive process:''' | ||