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Specific Process Knowledge/Lithography/UVLithography: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
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Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,531 edits
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|[[Specific_Process_Knowledge/Lithography/Coaters#KS Spinner|KS Spinner]]
|[[Specific_Process_Knowledge/Lithography/Coaters#KS Spinner|KS Spinner]]
|Thickness and process dependent.
|Thickness and process dependent.
|PGMEA, mr-Dev 600 developer
|mr-Dev 600 developer (PGMEA)
|IPA
|IPA
|Plasma ashing can remove crosslinked SU8.
|Plasma ashing can remove crosslinked SU8.
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